| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Valden, Mika
Tampere University
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (37/37 displayed)
- 2024Corrosion mechanisms of TiO2 photoelectrode coatings in alkaline conditions
- 2024Silver nanoparticle coatings with adjustable extinction spectra produced with liquid flame spray, and their role in photocatalytic enhancement of TiO2
- 2024Ti3+ Self-Doping-Mediated Optimization of TiO2 Photocatalyst Coating Grown by Atomic Layer Depositioncitations
- 2023Is Carrier Mobility a Limiting Factor for Charge Transfer in Tio2/Si Devices? A Study by Transient Reflectance Spectroscopycitations
- 2022Insights into Tailoring of Atomic Layer Deposition Grown TiO2 as Photoelectrode Coating
- 2022Low-Temperature Route to Direct Amorphous to Rutile Crystallization of TiO2Thin Films Grown by Atomic Layer Depositioncitations
- 2022Plasmonic Ag–Au/TiO2 nanocomposites for photocatalytic applications
- 2022Influence of Photodeposition Sequence on the Photocatalytic Activity of Plasmonic Ag–Au/TiO2 Nanocompositescitations
- 2022Tunable Ti3+-Mediated Charge Carrier Dynamics of Atomic Layer Deposition-Grown Amorphous TiO2citations
- 2021Visible to near-infrared broadband fluorescence from Ce-doped silica fibercitations
- 2021Interface Engineering of TiO2 Photoelectrode Coatings Grown by Atomic Layer Deposition on Siliconcitations
- 2020Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approachcitations
- 2020Optimization of photogenerated charge carrier lifetimes in ald grown tio2 for photonic applicationscitations
- 2019Fabrication of ultrathin multilayered superomniphobic nanocoatings by liquid flame spray, atomic layer deposition, and silanizationcitations
- 2019Defect engineering of atomic layer deposited TiO2 for photocatalytic applications
- 2019DLC-treated aramid-fibre compositescitations
- 2019DLC-treated aramid-fibre composites: Tailoring nanoscale-coating for macroscale performancecitations
- 2019Diversity of TiO2: Controlling the molecular and electronic structure of atomic layer deposited black TiO2citations
- 2019Highly efficient charge separation in model Z-scheme TiO2/TiSi2/Si photoanode by micropatterned titanium silicide interlayercitations
- 2019Influence of ex-situ annealing on the properties of MgF2 thin films deposited by electron beam evaporationcitations
- 2018Fabrication of ultrathin multilayered superomniphobic nanocoatings by liquid flame spray, atomic layer deposition, and silanizationcitations
- 2018Fabrication of ultrathin multilayered superomniphobic nanocoatings by liquid flame spray, atomic layer deposition, and silanizationcitations
- 2018Photo-electrochemical and spectroscopic investigation of ALD grown TiO2
- 2018Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
- 2018Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2018Improved Stability of Atomic Layer Deposited Amorphous TiO2 Photoelectrode Coatings by Thermally Induced Oxygen Defectscitations
- 2018The role of (FeCrSi)2(MoNb)-type Laves phase on the formation of Mn-rich protective oxide scale on ferritic stainless steelcitations
- 2017Photo-electrochemical and spectroscopic investigation of ALD grown TiO2
- 2017Improved corrosion properties of hot dip galvanized steel by nanomolecular silane layers as hybrid interface between zinc and top coatingscitations
- 2017Development of Advanced Fe–Cr Alloys for Demanding Applications Utilizing Synchrotron Light Mediated Electron Spectroscopy
- 2017Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
- 2017Investigation of the structural anisotropy in a self-assembling glycinate layer on Cu(100) by scanning tunneling microscopy and density functional theory calculationscitations
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2017Tailored Fabrication of Transferable and Hollow Weblike Titanium Dioxide Structurescitations
- 2016Grain orientation dependent Nb-Ti microalloying mediated surface segregation on ferritic stainless steelcitations
- 2016Fabrication of topographically microstructured titanium silicide interface for advanced photonic applicationscitations
- 2016Optimizing iron alloy catalyst materials for photoelectrochemical water splitting
Places of action
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document
Role of Oxide Defects in ALD grown TiO2 Coatings on Performance as Photoanode Protection Layer
Abstract
Photoelectrochemical (PEC) water splitting is one of the potential methods of utilizing solar energy. A major issue for the method and for renewable energy production is the development of an efficient, chemically stable and cost-effective semiconductor photoanode. Recently, titanium dioxide (TiO<sub>2</sub>) coatings grown by atomic layer deposition (ALD) have appeared to be a promising approach to stabilize semiconductor photoanodes under PEC conditions. In particular, amorphous ALD grown TiO<sub>2</sub> has shown exceptional charge transfer properties compared to its crystalline form that are not properly understood yet. Therefore, we target to gain better understanding on the defect structure of ALD grown TiO<sub>2</sub> and utilize the information in the development of optimal photoanode protection layer for efficient solar water splitting.<br/><br/>In this work, structural, optical and photoelectrochemical properties of the ALD grown TiO<sub>2</sub> films were studied in as-deposited condition and after annealing in air at 500 °C. TiO<sub>2</sub> films were grown on n-type phosphorus-doped silicon and fused quartz by ALD at 200 °C using tetrakis(dimethylamido)titanium (TDMAT) and deionized water as precursors. The properties of TiO<sub>2</sub> were investigated by X-ray photoelectron spectroscopy (XPS), ellipsometry and UV/Vis/NIR spectrophotometry. In addition, results from X-ray diffraction (XRD), Raman spectroscopy and photoelectrochemical (PEC) cell are discussed.<br/><br/>Based on the results, as-deposited TiO<sub>2</sub> is amorphous and absorbs visible light as ''black'' TiO<sub>2</sub>. After annealing in air at 500 °C TiO<sub>2</sub> crystallizes as rutile and becomes ''white'' TiO<sub>2</sub> that absorbs light only in the UV region. As-deposited TiO<sub>2</sub> contains significant amount of Ti<sup>3+/2+</sup> oxygen vacancies that are oxidized as Ti<sup>4+</sup> upon annealing in air. In addition, nitrogen is found only in as-deposited titanium dioxide. As-deposited TiO<sub>2</sub> is not chemically stable under PEC conditions. In contrast, the annealed TiO<sub>2</sub> is chemically stable and showed 0.20 % ABPE efficiency for water splitting reaction.<br/><br/>As a conclusion, Ti<sup>3+</sup> defects induce photocorrosion of ALD TiO<sub>2</sub> under PEC conditions. After annealing in air at 500 °C ALD TiO<sub>2</sub> is chemically stable and it can be used as a photoanode protection layer. In the future, research will be focused on optimizing the properties of ALD TiO<sub>2</sub>/Si interface and studying the structure of the surface after deposition of nickel electrocatalysts on TiO<sub>2</sub>/Si photoanode.<br/>