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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Rauch, Jean-Yves
Laboratoire Bourguignon des Matériaux et Procédés
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024Titanium oxynitride thin films by the reactive sputtering process with an independent pulsing of O2 and N2 gases
- 2022Tunable Electrical Properties of Ti-B-N Thin Films Sputter-Deposited by the Reactive Gas Pulsing Process
- 2016Effect of oxygen vacancies on crystallization and piezoelectric performance of PZTcitations
- 2016Modeling and characterization of piezoelectric beams based on an aluminum nitride thin-film layercitations
- 2016Temperature dependence of electrical resistivity in oxidized vanadium films grown by the GLAD techniquecitations
- 2013Acoustic resonator based on periodically poled lithium niobate ridgecitations
- 2013Metal-to-Dielectric transition induced by annealing of oriented titanium thin films
- 2013Metal-to-dielectric transition induced by annealing of oriented titanium thin filmscitations
- 2012Ammonia gas sensors based on polypyrrole films: Influence of electrodeposition parameterscitations
- 2010Manufacture of microfluidic glass chips by deep plasma etching, femtosecond laser ablation, and anodic bondingcitations
- 2010One-pot electrosynthesis of polyglycine-like thin film on platinum electrodes as transducer for solid state pH measurementscitations
- 2010Electrochemically deposited polyethyleneimine films and their characterizationcitations
- 2009Physical and Mechanical Properties of CrAlN and CrSiN Ternary Systems for Wood Machining Applicationscitations
- 2009Preparation of flat gold terraces for protein chip developmentscitations
- 2007Development of miniaturized pH biosensors based on electrosynthesized polymer filmscitations
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article
Metal-to-Dielectric transition induced by annealing of oriented titanium thin films
Abstract
Titanium thin films were deposited by DC magnetron sputtering. The glancing angle deposition (GLAD) method was implemented to prepare two series of titanium films: perpendicular and oriented columnar structures. The first series was obtained with a conventional incident angle α of the sputtered particles (α = 0°), whereas the second one used a grazing incident angle α = 85°. Afterwards, the films were annealed in air using six cycles of temperature ranging from 293 K to 773 K. DC electrical conductivity was measured during the annealing treatment. Films deposited by conventional sputtering (α = 0°) kept a typical metallic-like behavior versus temperature (σ300 K = 2.0 × 10^6 S m-1 and TCR293 K = 1.52 × 10^-3 K-1), whereas those sputtered with α = 85° showed a gradual transition from metal to dielectric. Such a transition was mainly attributed to the high porous structure, which favors the oxidation of titanium films to tend to the TiO2 compound.