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Rogers, Helen
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document
Facet machining of silica waveguides with nanoscale roughness without polishing or lapping
Abstract
To achieve low-loss free space coupling for integrated optics, device facets need to be smooth, free of chips and flat. The typical route for accomplishing these requirements is by traditional lapping and polishing. We report that high quality optical quality facets with a Sa = 4.9 nm can be machined using a simple dicing technique. In order to directly measure the scatter loss a device with a series of Bragg gratings is used to characterise the average interface loss per facet.