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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Kaneko, Satoru
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Publications (3/3 displayed)
- 2022Advances in Titanium/Polymer Hybrid Joints by Carbon Fiber Plug Insert: Current Status and Reviewcitations
- 2021Polarization Rotation at Morphotropic Phase Boundary in New Lead-Free Na1/2Bi1/2V1-xTi xO3 Piezoceramicscitations
- 2018Fabrication of nitrogen-containing diamond-like carbon film by filtered arc deposition as conductive hard-coating filmcitations
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article
Fabrication of nitrogen-containing diamond-like carbon film by filtered arc deposition as conductive hard-coating film
Abstract
Diamond-like carbon (DLC) films, which are amorphous carbon films, have been used as hard-coating films for protecting the surface of mechanical parts. Nitrogen-containing DLC (N-DLC) films are expected as conductive hard-coating materials. N-DLC films are expected in applications such as protective films for contact pins, which are used in the electrical check process of integrated circuit chips. In this study, N-DLC films are prepared using the T-shaped filtered arc deposition (T-FAD) method, and film properties are investigated. Film hardness and film density decreased when the N content increased in the films because the number of graphite structures in the DLC film increased as the N content increased. These trends are similar to the results of a previous study. The electrical resistivity of N-DLC films changed from 0.26 to 8.8Ωcm with a change in the nanoindentation hardness from 17 to 27GPa. The N-DLC films fabricated by the T-FAD method showed high mechanical hardness and low electrical resistivity.