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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Bohuslavskyi, Heorhii
VTT Technical Research Centre of Finland
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- 2024Wafer-scale CMOS-compatible graphene Josephson field-effect transistorscitations
- 2024Wafer-scale CMOS-compatible graphene Josephson field-effect transistors
- 2018Electrically driven electron spin resonance mediated by spin–valley–orbit coupling in a silicon quantum dotcitations
- 2018Electrically driven electron spin resonance mediated by spin–valley–orbit coupling in a silicon quantum dotcitations
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document
Wafer-scale CMOS-compatible graphene Josephson field-effect transistors
Abstract
Electrostatically tunable Josephson field-effect transistors (JoFETs) are one of the most desired building blocks of quantum electronics. JoFET applications range from parametric amplifiers and superconducting qubits to a variety of integrated superconducting circuits. Here, we report on graphene JoFET devices fabricated with wafer-scale complementary metal-oxide-semiconductor (CMOS) compatible processing based on wet transfer of chemical vapour deposited graphene, atomic-layer-deposited Al$_{2}$O$_{3}$ gate oxide, and evaporated superconducting Ti/Al source, drain, and gate contacts. By optimizing the contact resistance down to170 $Ωμm$, we observe proximity-induced superconductivity in the JoFET channels with different gate lengths of 150 - 350 nm. The Josephson junction devices show reproducible critical current $I_{{C}}$ tunablity with the local top gate. Our JoFETs are in short diffusive limit with the $I_{{C}}$ reaching up to $\,$3 $μA$ for a 50 $μm$ channel width. Overall, the successful demonstration of CMOS-compatible 2D-material-based JoFET fabrication process is an important step towards graphene-based integrated quantum devices.