| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Nakajima, Hideki
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Publications (7/7 displayed)
- 2023A novel carbon electrode for up-scaling flexible perovskite solar cellscitations
- 2023Unrevealing tunable resonant excitons and correlated plasmons and their coupling in new amorphous carbon-like for highly efficient photovoltaic devicescitations
- 2021Preparation of low-temperature phase MnBi by sintering in vacuumcitations
- 2020Structural Analysis of Boron- and Nitrogen-Doped Amorphous Carbon Films from Bio-Productcitations
- 2020Electronic and Thermoelectric Properties of Graphene on 4H-SiC (0001) Nanofacets Functionalized with F4-TCNQ
- 2019Structural Analysis and Electrical Properties of Amorphous Carbon Thin Filmscitations
- 2019Spectroscopic Analyses of Sputtered Aluminum Oxide Films with Oxygen Plasma Treatmentscitations
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article
Spectroscopic Analyses of Sputtered Aluminum Oxide Films with Oxygen Plasma Treatments
Abstract
<jats:p>X-ray photoelectron spectroscopy (XPS) and Spectroscopic Ellipsometry (SE) were used to analyse the effect of oxygen plasma treatment on properties of aluminum oxide thin films. The aluminum oxide films were fabricated using a reactive sputtering system. The as-deposited films were treated with oxygen plasma powered by an RF generator. During the plasma treatment, the pressures were set at 1 x 10<jats:sup>-1</jats:sup> to 1x 10<jats:sup>-2</jats:sup> mbar, while the RF supplied powers at 100 W and 200 W. It was observed that lower plasma powers and higher pressures resulted in smoother films. The O/Al ratio of the films were found to decrease with increasing plasma powers and pressures. The thickness and refractive index of the films were significantly affected by the oxygen plasma treatment process, which could be related to the change in films’ packing density and the etching at the surface.</jats:p>