693.932 PEOPLE
| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Gibson, Desmond
University of the West of Scotland
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (23/23 displayed)
- 2024Giant piezoelectric effect induced by porosity in inclined ZnO thin filmscitations
- 2024Optical and structural properties of silicon nitride thin films deposited by plasma enhanced chemical vapor deposition for high reflectance optical mirrors
- 2024Non-stoichiometric silicon nitride for future gravitational wave detectorscitations
- 2023Broadband infrared absorber based on a sputter deposited hydrogenated carbon multilayer enhancing MEMS-based CMOS thermopile performancecitations
- 2022High throughput low cost closed field magnetron sputter deposition of durable reflectors based on dielectric overcoated metal for application in non-dispersive infrared gas sensors
- 2022High throughput microwave plasma assisted sputter deposition of linear variable filters and deployment into visible and near infrared spectrometers
- 2021Glancing angle deposition of nanostructured ZnO films for ultrasonicscitations
- 2020Effect of physical activation/surface functional groups on wettability and electrochemical performance of carbon/activated carbon aerogels based electrode materials for electrochemical capacitorscitations
- 2020Durable infrared optical coatings based on pulsed DC-sputtering of hydrogenated amorphous carbon (a-C:H)citations
- 2019Effect of nitrogen doping on the electrochemical performance of resorcinol-formaldehyde based carbon aerogels as electrode material for supercapacitor applicationscitations
- 2018FORMATION OF PIEZOELECTRIC DEVICES
- 2017Influence of europium on structure modification of TiO2 thin films prepared by high energy magnetron sputtering processcitations
- 2017Modification of various properties of HfO2 thin films obtained by changing magnetron sputtering conditionscitations
- 2017Investigation of the antimicrobial properties of modified multilayer diamond-like carbon coatings on 316 stainless steel surface and coatings technologycitations
- 2017Characterisation of Cu2O, Cu4O3, and CuO mixed phase thin films produced by microwave-activated reactive sputteringcitations
- 2017Characterisation of Cu2O/CuO thin films produced by plasma-assisted DC sputtering for solar cell applicationcitations
- 2016Investigation of various properties of HfO2-TiO2 thin film composites deposited by multi-magnetron sputtering systemcitations
- 2016Nanostructured ZnO films prepared by hydro-thermal chemical deposition and microwave-activated reactive sputteringcitations
- 2015Investigation of structural, optical and micro-mechanical properties of (NdyTi1-y)O-x thin films deposited by magnetron sputteringcitations
- 2015The Effect of Growth Conditions on the Surface Energy, Optical Properties and Saline Corrosion Resistance of Amorphous Chromium Oxide Thin Films Prepared by Reactive Magnetron Sputtering
- 2011Large-aperture plasma-assisted deposition of inertial confinement fusion laser coatingscitations
- 2010Large-aperture plasma-assisted deposition of ICF laser coatings
- 2010High ion current density plasma source for ion-assisted deposition of optical thin filmscitations
Places of action
| Organizations | Location | People |
|---|
article
High ion current density plasma source for ion-assisted deposition of optical thin films
Abstract
<p>A plasma source utilizing direct current (DC) voltage between an anode and a hot hollow cathode is employed to create high-density plasma. Plasma spatial distribution, ion energy, plasma neutralisation, and current densities are found to be separately tunable. Ion current densities >0.5 mA/cm<sup>2</sup> have been demonstrated over coating areas >1 m diameter. The primary advantage of plasma, as opposed to the ion source approach, is its ability to fill in the vacuum chamber and the couple with evaporant. This induces partial evaporant ionisation, providing uniform ion-assisted deposition over extended coating areas. Optical thin film properties deposited using the adapted high ion current plasma source are likewise described.</p>