| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Hettler, Simon
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2024Synthesis and dynamics of PtSi nanoparticles on a carbon nanofilm by in-situ TEM Joule heating
- 2023Tungsten oxide mediated quasi-van der Waals Epitaxy of WS2 on Sapphirecitations
- 2023Tungsten oxide mediated quasi-van der Waals epitaxy of WS2on sapphirecitations
- 2022In depth investigations of graphene oxide reduction via in-situ TEM measurements
- 2022Onion-like Fe3O4/MgO/CoFe2O4 magnetic nanoparticles: new ways to control magnetic coupling between soft and hard magnetic phasescitations
- 2021A Detailed Investigation of the Onion Structure of Exchanged Coupled Magnetic Fe3-delta O4@CoFe2O4@Fe3-delta O4 Nanoparticlescitations
- 2021A detailed investigation of the onion structure of exchanged coupled magnetic Fe3-δO4@CoFe2O4@Fe3-δO4 nanoparticlescitations
- 2019Fabrication of phase masks from amorphous carbon thin films for electron-beam shapingcitations
- 2018Charging of carbon thin films in scanning and phase-plate transmission electron microscopycitations
- 2016Thin-Film Phase Plates for Transmission Electron Microscopy Fabricated from Metallic Glassescitations
Places of action
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article
Fabrication of phase masks from amorphous carbon thin films for electron-beam shaping
Abstract
Background: Electron-beam shaping opens up the possibility for novel imaging techniques in scanning (transmission) electron microscopy (S(T)EM). Phase-modulating thin-film devices (phase masks) made of amorphous silicon nitride are commonly used to generate a wide range of different beam shapes. An additional conductive layer on such a device is required to avoid charging under electron-beam irradiation, which induces unwanted scattering events.Results: Phase masks of conductive amorphous carbon (aC) were successfully fabricated with optical lithography and focused ion beam milling. Analysis by TEM shows the successful generation of Bessel and vortex beams. No charging or degradation of the aC phase masks was observed.Conclusion: Amorphous carbon can be used as an alternative to silicon nitride for phase masks at the expense of a more complex fabrication process. The quality of arbitrary beam shapes could benefit from the application of phase masks made of amorphous C.