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Robertson, Georgina
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article
Thin-film engineering of mechanical fragmentation properties of atomic-layer-deposited metal oxides
Abstract
Mechanical fracture properties were studied for the common atomic-layer-deposited Al 2 O 3 , ZnO, TiO 2 , ZrO 2 , and Y 2 O 3 thin films, and selected multilayer combinations via uniaxial tensile testing and Weibull statistics. The crack onset strains and interfacial shear strains were studied, and for crack onset strain, TiO 2 /Al 2 O 3 and ZrO 2 /Al 2 O 3 bilayer films exhibited the highest values. The films adhered well to the polyimide carrier substrates, as delamination of the films was not observed. For Al 2 O 3 films, higher deposition temperatures resulted in higher crack onset strain and cohesive strain values, which was explained by the temperature dependence of the residual strain. Doping Y 2 O 3 with Al or nanolaminating it with Al 2 O 3 enabled control over the crystal size of Y 2 O 3 , and provided us with means for improving the mechanical properties of the Y 2 O 3 films. Tensile fracture toughness and fracture energy are reported for Al 2 O 3 films grown at 135 ◦ C, 155°C, and 220 ◦ C. We present thin-film engineering via multilayering and residual-strain control in order to tailor the mechanical properties of thin-film systems for applications requiring mechanical stretchability and flexibility.