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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Teodoro, Orlando
Universidade Nova de Lisboa
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2023Amorphous carbon thin filmscitations
- 2023The Role of Hydrogen Incorporation into Amorphous Carbon Films in the Change of the Secondary Electron Yieldcitations
- 2020Free-standing N-Graphene as conductive matrix for Ni(OH)2 based supercapacitive electrodescitations
- 2019Nanocomposite thin films based on Au-Ag nanoparticles embedded in a CuO matrix for localized surface plasmon resonance sensingcitations
- 2018Development of Au/CuO nanoplasmonic thin films for sensing applicationscitations
- 2016Surface modifications on as-grown boron doped CVD diamond films induced by the B2O3-ethanol-Ar systemcitations
- 2014Ion-plasma treatment of reed switch contactscitations
- 2013Amorphous Carbon Coatings: Temperature Effect on Secondary Electron Yield (SEY)
- 2013Study of SEY degradation of amorphous carbon coatings
- 2013Increase of secondary electron yield of amorphous carbon coatings under high vacuum conditionscitations
- 2012An upgraded TOF-SIMS VG Ionex IX23LS: Study on the negative secondary ion emission of III-V compound semiconductors with prior neutral cesium depositioncitations
- 2012TOF-SIMS study of cystine and cholesterol stonescitations
- 2009Characterisation of DLC Films Deposited Using Titanium Isopropoxide (TIPOT) at Different Flow Ratescitations
- 2006Characterisation of metal/mould interface on investment casting of γ-TiAlcitations
- 2005Evaluation of y2O3 as front layer of ceramic crucibles for vaccum induction melting of TiAl based alloys
- 2002Anomalous growth of Ba on Ag(111)citations
Places of action
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article
The Role of Hydrogen Incorporation into Amorphous Carbon Films in the Change of the Secondary Electron Yield
Abstract
<jats:p>Over the last few years, there has been increasing interest in the use of amorphous carbon thin films with low secondary electron yield (SEY) to mitigate electron multipacting in particle accelerators and RF devices. Previous works found that the SEY increases with the amount of incorporated hydrogen and correlates with the Tauc gap. In this work, we analyse films produced by magnetron sputtering with different contents of hydrogen and deuterium incorporated via the target poisoning and sputtering of CxDy molecules. XPS was implemented to estimate the phase composition of the films. The maximal SEY was found to decrease linearly with the fraction of the graphitic phase in the films. These results are supported by Raman scattering and UPS measurements. The graphitic phase decreases almost linearly for hydrogen and deuterium concentrations between 12% and 46% (at.), but abruptly decreases when the concentration reaches 53%. This vanishing of the graphitic phase is accompanied by a strong increase of SEY and the Tauc gap. These results suggest that the SEY is not dictated directly by the concentration of H/D, but by the fraction of the graphitic phase in the film. The results are supported by an original model used to calculate the SEY of films consisting of a mixture of graphitic and polymeric phases.</jats:p>