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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Jasulaitiene, Vitalija
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2024The Dependence of NiMo/Cu Catalyst Composition on Its Catalytic Activity in Sodium Borohydride Hydrolysis Reactionscitations
- 2023Aluminum Anodizing in an Aqueous Solution of Formic Acid with Ammonium Heptamolybdate Additivecitations
- 2023Investigation of Hydrogen and Oxygen Evolution on Cobalt-Nanoparticles-Supported Graphitic Carbon Nitridecitations
- 2023Black Liquor and Wood Char-Derived Nitrogen-Doped Carbon Materials for Supercapacitorscitations
- 2023Growth of Magnetron-Sputtered Ultrathin Chromium Films: In Situ Monitoring and Ex Situ Film Propertiescitations
- 2023Non-Precious Metals Catalysts for Hydrogen Generationcitations
- 2022Impact of Low-Pressure Plasma Treatment of Wool Fabric for Dyeing with PEDOT: PSScitations
- 2021Synthesis of Carbon-Supported MnO2 Nanocomposites for Supercapacitors Applicationcitations
- 2016Electroless Deposition of Cobalt-Tungsten-Boron Films from Glycine Containing Solutions As Barrier Layer Against Cu Diffusion
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article
Growth of Magnetron-Sputtered Ultrathin Chromium Films: In Situ Monitoring and Ex Situ Film Properties
Abstract
We report a systematic nanoscale investigation on the ultrathin Cr film growth process and properties. Polycrystalline metallic films were manufactured by magnetron sputtering on fused silica substrates. The film growth was observed in situ by broad-band optical monitoring (BBM) and plasma-emission spectroscopy (OES) methods. The ex situ characterization of the Cr films with thicknesses varying from 2.6 nm up to 57 nm were performed by both non-destructive and destructive techniques. Recently, we reported on a novel set of data for optical and electrical properties of sputtered chromium films. The optical and electrical properties of the films are known to be governed by their structure and microstructure, which were analyzed in detail in the present research. Moreover, the optical properties of the films were studied here in a significantly wider optical range and obtained using both in situ and ex situ measurements. Reliable in situ nanoscale characterization of metal films was shown to ensure an unfailing approach in obtaining ultrathin layers with desirable thickness and stable and well-determined optical constants and electrical conductivity. This is of high importance for various industries and novel upcoming applications.