| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Gric, Tatjana
Vilnius Gediminas Technical University
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (9/9 displayed)
- 2023An asymptotic homogenization formula for complex permittivity and its application
- 2023Growth of Magnetron-Sputtered Ultrathin Chromium Films: In Situ Monitoring and Ex Situ Film Propertiescitations
- 2022On the study of the THz metamaterials to deal with the dielectric response of the cancerous biological tissuescitations
- 2021Looking Into Surface Plasmon Polaritons Guided by the Acoustic Metamaterialscitations
- 2021Controlling Surface Plasmon Polaritons Propagating at the Boundary of Low-Dimensional Acoustic Metamaterialscitations
- 2021The Study of the Surface Plasmon Polaritons at the Interface Separating Nanocomposite and Hypercrystalcitations
- 2020Metamaterial formalism approach for advancing the recognition of glioma areas in brain tissue biopsiescitations
- 2018Investigation of Hyperbolic Metamaterialscitations
- 2015Analytic solution to field distribution in two-dimensional inhomogeneous waveguidescitations
Places of action
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article
Growth of Magnetron-Sputtered Ultrathin Chromium Films: In Situ Monitoring and Ex Situ Film Properties
Abstract
We report a systematic nanoscale investigation on the ultrathin Cr film growth process and properties. Polycrystalline metallic films were manufactured by magnetron sputtering on fused silica substrates. The film growth was observed in situ by broad-band optical monitoring (BBM) and plasma-emission spectroscopy (OES) methods. The ex situ characterization of the Cr films with thicknesses varying from 2.6 nm up to 57 nm were performed by both non-destructive and destructive techniques. Recently, we reported on a novel set of data for optical and electrical properties of sputtered chromium films. The optical and electrical properties of the films are known to be governed by their structure and microstructure, which were analyzed in detail in the present research. Moreover, the optical properties of the films were studied here in a significantly wider optical range and obtained using both in situ and ex situ measurements. Reliable in situ nanoscale characterization of metal films was shown to ensure an unfailing approach in obtaining ultrathin layers with desirable thickness and stable and well-determined optical constants and electrical conductivity. This is of high importance for various industries and novel upcoming applications.