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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Cristea, Daniel
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (6/6 displayed)
- 2023Functional Surfaces via Laser Processing in Nickel Acetate Solutioncitations
- 2023Multi-Parametric Exploration of a Selection of Piezoceramic Materials for Bone Graft Substitute Applicationscitations
- 2022On the chemistry, photocatalytical, and corrosion behavior of co-sputtered tantalum and titanium oxynitride thin filmscitations
- 2021Effect of Pulsing Configuration and Magnetic Balance Degree on Mechanical Properties of CrN Coatings Deposited by Bipolar-HiPIMS onto Floating Substratecitations
- 2019Metastable Al–Si–Ni Alloys for Additive Manufacturing: Structural Stability and Energy Release during Heatingcitations
- 2018The Influence of Powder Particle and Grain Size on Parts Manufacturing by Powder Bed Fusioncitations
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article
Effect of Pulsing Configuration and Magnetic Balance Degree on Mechanical Properties of CrN Coatings Deposited by Bipolar-HiPIMS onto Floating Substrate
Abstract
<jats:p>Despite its great potential for thin films deposition and technological applications, the HiPIMS technology has its own limitations including the control of ion energy and flux towards the substrate when coping with the deposition of electrical insulating films and/or the deposition onto insulating/electrically grounded substrates. The bipolar-HiPIMS has been recently developed as a strategy to accelerate the plasma ions towards a growing film maintained at ground potential. In this work, the benefits of bipolar-HiPIMS deposition onto floating or nonconductive substrates are explored. The effect of bipolar-HIPIMS pulsing configuration, magnetic balance-unbalance degree, and substrate’s condition on plasma characteristics, microstructure evolution, and mechanical properties of CrN coatings was investigated. During the deposition with a balanced magnetron configuration, a significant ion bombardment effect was detected when short negative pulses and relative long positive pulses were used. XRD analysis and AFM observations revealed significant microstructural changes by increasing the positive pulse duration, which results in an increase in hardness from 7.3 to 16.2 GPa, during deposition on grounded substrates, and from 4.9 to 9.4 GPa during the deposition on floating substrates. The discrepancies between the hardness values of the films deposited on floating substrates and those of the films deposited on grounded substrates become smaller/larger when a type I/type II unbalanced magnetron configuration is used. Their hardness ratio was found to be 0.887, in the first case, and 0.393, in the second one. Advanced application-tailored coatings can be deposited onto floating substrates by using the bipolar-HiPIMS technology if short negative pulses, relative long positive pulses together with type I unbalanced magnetron are concomitantly used.</jats:p>