Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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University of Helsinki

in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (6/6 displayed)

  • 2022Characterization of Heavily Irradiated Dielectrics for Pixel Sensors Coupling Insulator Applications1citations
  • 2022Multispectral photon-counting for medical imaging and beam characterization - A project review1citations
  • 2021AC-coupled n-in-p pixel detectors on MCz silicon with atomic layer deposition (ALD) grown thin film5citations
  • 2021Processing and Interconnections of Finely Segmented Semiconductor Pixel Detectors for Applications in Particle Physics and Photon Detection2citations
  • 2020Processing of AC-coupled n-in-p pixel detectors on MCz silicon using atomic layer deposited aluminium oxide10citations
  • 2019Effects of Defects to the Performance of CdTe Pad Detectors in IBIC Measurements2citations

Places of action

Chart of shared publication
Ott, Jennifer
6 / 22 shared
Bharthuar, Shudhashil
5 / 7 shared
Kirschenmann, Stefanie
4 / 6 shared
Mizohata, Kenichiro
1 / 99 shared
Kramarenko, Nikita
2 / 4 shared
Koponen, Pirkitta
2 / 6 shared
Golovleva, Maria
4 / 8 shared
Tuominen, Eija
2 / 8 shared
Härkönen, Jaakko
3 / 10 shared
Luukka, Panja
6 / 14 shared
Bezak, Mihaela
3 / 5 shared
Gädda, Akiko
4 / 12 shared
Karadzhinova-Ferrer, Aneliya Georgieva
4 / 7 shared
Kalliokoski, Matti
4 / 8 shared
Winkler, Alexander
3 / 8 shared
Särkkä, Simo
1 / 2 shared
Siiskonen, Teemu
1 / 2 shared
Turpeinen, Raimo
1 / 2 shared
Tikkanen, Joonas Samuli
1 / 2 shared
Karjalainen, Ahti
1 / 2 shared
Petrow, Henri
1 / 2 shared
Emzir, Muhammad
1 / 2 shared
Tuovinen, Esa
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Karadzhinova-Ferrer, Aneliya
1 / 3 shared
Litichevskyi, Vladyslav
3 / 3 shared
Chmill, Valery
1 / 1 shared
Martikainen, Laura
2 / 3 shared
Bezak, M.
1 / 5 shared
Harkonen, J.
1 / 1 shared
Tuovinen, E.
1 / 3 shared
Gadda, A.
2 / 3 shared
Naaranoja, Tiina Sirea
1 / 1 shared
Härkonen, J.
1 / 2 shared
Golovleva, M.
1 / 7 shared
Chart of publication period
2022
2021
2020
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Co-Authors (by relevance)

  • Ott, Jennifer
  • Bharthuar, Shudhashil
  • Kirschenmann, Stefanie
  • Mizohata, Kenichiro
  • Kramarenko, Nikita
  • Koponen, Pirkitta
  • Golovleva, Maria
  • Tuominen, Eija
  • Härkönen, Jaakko
  • Luukka, Panja
  • Bezak, Mihaela
  • Gädda, Akiko
  • Karadzhinova-Ferrer, Aneliya Georgieva
  • Kalliokoski, Matti
  • Winkler, Alexander
  • Särkkä, Simo
  • Siiskonen, Teemu
  • Turpeinen, Raimo
  • Tikkanen, Joonas Samuli
  • Karjalainen, Ahti
  • Petrow, Henri
  • Emzir, Muhammad
  • Tuovinen, Esa
  • Karadzhinova-Ferrer, Aneliya
  • Litichevskyi, Vladyslav
  • Chmill, Valery
  • Martikainen, Laura
  • Bezak, M.
  • Harkonen, J.
  • Tuovinen, E.
  • Gadda, A.
  • Naaranoja, Tiina Sirea
  • Härkonen, J.
  • Golovleva, M.
OrganizationsLocationPeople

article

Characterization of Heavily Irradiated Dielectrics for Pixel Sensors Coupling Insulator Applications

  • Ott, Jennifer
  • Bharthuar, Shudhashil
  • Kirschenmann, Stefanie
  • Mizohata, Kenichiro
  • Kramarenko, Nikita
  • Koponen, Pirkitta
  • Brucken, Jens Erik
  • Golovleva, Maria
  • Tuominen, Eija
  • Härkönen, Jaakko
  • Luukka, Panja
  • Bezak, Mihaela
  • Gädda, Akiko
  • Karadzhinova-Ferrer, Aneliya Georgieva
Abstract

<p>An increase in the radiation levels during the high-luminosity operation of the Large Hadron Collider calls for the development of silicon-based pixel detectors that are used for particle tracking and vertex reconstruction. Unlike the conventionally used conductively coupled (DC-coupled) detectors that are prone to an increment in leakage currents due to radiation, capacitively coupled (AC-coupled) detectors are anticipated to be in operation in future collider experiments suitable for tracking purposes. The implementation of AC-coupling to micro-scale pixel sensor areas enables one to provide an enhanced isolation of radiation-induced leakage currents. The motivation of this study is the development of new generation capacitively coupled (AC-coupled) pixel sensors with coupling insulators having good dielectric strength and radiation hardness simultaneously. The AC-coupling insulator thin films were aluminum oxide (Al2O3) and hafnium oxide (HfO2) grown by the atomic layer deposition (ALD) method. A comparison study was performed based on the dielectric material used in MOS, MOSFET, and AC-coupled pixel prototypes processed on high resistivity p-type Magnetic Czochralski silicon (MCz-Si) substrates. Post-irradiation studies with 10 MeV protons up to a fluence of 10(15) protons/cm(2) suggest HfO2 to be a better candidate as it provides higher sensitivity with negative charge accumulation on irradiation. Furthermore, even though the nature of the dielectric does not affect the electric field within the AC-coupled pixel sensor, samples with HfO2 are comparatively less susceptible to undergo an early breakdown due to irradiation. Edge-transient current technique (e-TCT) measurements show a prominent double-junction effect as expected in heavily irradiated p-type detectors, in accordance with the simulation studies.</p>

Topics
  • impedance spectroscopy
  • resistivity
  • experiment
  • thin film
  • simulation
  • aluminum oxide
  • aluminium
  • laser emission spectroscopy
  • strength
  • hardness
  • Silicon
  • hafnium
  • atomic layer deposition
  • dielectric strength
  • hafnium oxide