| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Högberg, Hans
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (37/37 displayed)
- 2024The Influence of Carbon on Polytype and Growth Stability of Epitaxial Hexagonal Boron Nitride Filmscitations
- 2024On the origin of epitaxial rhombohedral-B4C growth by CVD on 4H-SiC†citations
- 2024Chemical Reactivity and Alteration of Pyrite Mineral in the Kubi Gold Concession in Ghanacitations
- 2024On the origin of epitaxial rhombohedral-B<sub>4</sub>C growth by CVD on 4H-SiCcitations
- 2023The influence of carbon on polytype and growth stability of epitaxial hexagonal boron nitride films and layerscitations
- 2023Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboroncitations
- 2023Substrate bias effects on cathodic arc deposited Cr coatingscitations
- 2023Chemical vapor deposition of amorphous boron carbide coatings from mixtures of trimethylboron and triethylboroncitations
- 2022Texture evolution in rhombohedral boron carbide films grown on 4H-SiC(0001) and 4H-SiC(0001) substrates by chemical vapor depositioncitations
- 2022Review of Transition-Metal Diboride Thin Filmscitations
- 2022Ti thin films deposited by high-power impulse magnetron sputtering in an industrial system : Process parameters for a low surface roughnesscitations
- 2020The effect of N, C, Cr, and Nb content on silicon nitride coatings for joint applicationscitations
- 2020The Effect of N, C, Cr, and Nb Content on Silicon Nitride Coatings for Joint Applicationscitations
- 2020Chemical vapor deposition of sp(2)-boron nitride on Si(111) substrates from triethylboron and ammonia: Effect of surface treatmentscitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Atom probe tomography field evaporation characteristics and compositional corrections of ZrB2citations
- 2019Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmospherecitations
- 2019A simple model for non-saturated reactive sputtering processescitations
- 2019Thermodynamic stability of hexagonal and rhombohedral boron nitride under chemical vapor deposition conditions from van der Waals corrected first principles calculationscitations
- 2018Cubic boron phosphide epitaxy on zirconium diboridecitations
- 2017Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Depositioncitations
- 2017Gas Phase Chemistry of Trimethylboron in Thermal Chemical Vapor Depositioncitations
- 2017Synthesis and properties of CSxFy thin films deposited by reactive magnetron sputtering in an Ar/SF6 dischargecitations
- 2016Theoretical and experimental study of metastable solid solutions and phase stability within the immiscible Ag-Mo binary systemcitations
- 2016High-temperature nanoindentation of epitaxial ZrB2 thin filmscitations
- 2015Initial stages of growth and the influence of temperature during chemical vapor deposition of sp(2)-BN filmscitations
- 2014Direct current magnetron sputtered ZrB2 thin films on 4H-SiC(0001) and Si(100)citations
- 2014beta-Ta and alpha-Cr thin films deposited by high power impulse magnetron sputtering and direct current magnetron sputtering in hydrogen containing plasmascitations
- 2012Contact resistance of Ti-Si-C-Ag and Ti-Si-C-Ag-Pd nanocomposite coatingscitations
- 2012On the effect of water and oxygen in chemical vapor deposition of boron nitridecitations
- 2012Growth of ti-C nanocomposite films by reactive high power impulse magnetron sputtering under industrial conditionscitations
- 2012Ni and Ti diffusion barrier layers between Ti-Si-C-Ag nanocomposite coatings and Cu-based substratescitations
- 2011Epitaxial CVD growthof sp2-hybridized boron nitrideusing aluminum nitride as buffer layercitations
- 2010High-rate deposition of amorphous and nanocomposite Ti-Si-C multifunctional coatingscitations
- 2010Conductive nanocomposite ceramics as tribological and electrical contact materialscitations
- 2010The M(n+1)AX(n) phases: Materials science and thin-film processingcitations
- 2006Growth and Property Characterization of Epitaxial MAX-Phase Thin Films from the Ti<sub>n+1</sub>(Si, Ge, Sn)C<sub>n</sub> Systemscitations
Places of action
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document
The influence of carbon on polytype and growth stability of epitaxial hexagonal boron nitride films and layers
Abstract
<jats:p>Boron nitride (BN) is a promising two-dimensional material as well as a potential wide-bandgap semiconductor. Chemical vapor deposition (CVD) is commonly used to deposit single layers or thin films of BN, but the deposition process is insufficiently understood at an atomic scale. We study the CVD of BN using two boron precursors, the organoboranes, triethylborane and trimethylborane. Using high resolution (scanning) transmission electron microscopy and electron energy loss spectroscopy we show that hexagonal-BN (h-BN) nucleates and grows epitaxially for ~4 nm before it either polytype transforms to rhombohedral-BN (r-BN), turns to less ordered turbostratic-BN or is terminated by a layer of amorphous carbon. We propose that the carbon in the organoboranes deposits on the epitaxially growing h-BN surface and this either leads to the polytype transition to r-BN, the transition to less ordered BN growth or complete surface poisoning with carbon terminating BN growth. Our results question the use of organoboranes in CVD of epitaxial BN films, and the polytype stability of h-BN growing on graphene.</jats:p>