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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Kočí, Jan | Prague |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Frare, Bruno L. Segat
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document
On-chip hybrid erbium-doped tellurium oxide-silicon nitride distributed Bragg reflector lasers
Abstract
<jats:title>Abstract</jats:title><jats:p>We demonstrate integrated on-chip erbium-doped tellurite (TeO<jats:sub>2</jats:sub>:Er<jats:sup>3+</jats:sup>) waveguide lasers fabricated on a wafer-scale silicon nitride platform. A 0.352-µm-thick TeO<jats:sub>2</jats:sub>:Er<jats:sup>3+</jats:sup> coating was deposited as an active medium on 0.2-µm-thick, 1.2- and 1.6-µm-wide, and 22-mm-long silicon nitride waveguides with sidewall-patterned asymmetrical distributed Bragg reflector cavities. The lasers yield efficiencies between 0.06 and 0.36%, lasing threshold ranging from 13 to 26 mW, and emission within the C-band (1530–1565 nm). These results establish new opportunities for this hybrid tellurite glass-silicon nitride platform, such as the co-integration of passive components and light sources in the telecom window, and provide the foundation for the development of efficient, compact, and high-output-power on-chip erbium-doped tellurite waveguide lasers.</jats:p>