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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Malyshev, Oleg
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2024V₃Si: an alternative thin film material for superconducting RF cavities
- 2024Upgraded multiprobe sample inserts for thin film SRF cavity developments
- 2024A high throughput facility for the RF characterisation Of planar superconducting thin films
- 2023V3Si Thin Films for SRF Applications
- 2023The effect of small bends in thin non-evaporable getter coated tubes on the partial pressure ratio as a function of sticking probability
- 2023Deposition and Characterisation of V₃Si films for SRF Applications
- 2022A First 6 GHz Cavity Deposition with B1 Superconducting Thin Film at ASTeC
- 2019PVD Depostion of Nb₃Sn Thin Film on Copper Substrate from an Alloy Nb₃Sn Target
- 2019Impact of the Cu Substrate Surface Preparation on the Morphological, Superconductive and RF Properties of the Nb Superconductive Coatings
- 2017Atomic Layer Deposition of Niobium Nitride from Different Precursors
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document
Atomic Layer Deposition of Niobium Nitride from Different Precursors
Abstract
Advancements in technology have taken bulk niobium cavities close to their theoretical operational limits of 45 MV/m, pushing the research to explore novel materials, such as niobium based alloys . Theoretical studies suggest that a composite material composed of alternative superconductor / insulator multilayers would surpass the bulk niobium limits. Chemical vapour deposition (CVD) can deposit mi-crons thick Nb films in less than an hour, at the expense of precise thickness control. Atomic layer deposition (ALD), instead, even if considerably slower than CVD can be used in applications where the thickness of the deposited layers needs to be controlled with a resolution down to the nanometer. This article presents the preliminary results obtained by using plasma assisted ALD techniques to deposit NbN based compounds starting from chlorinated precursors and organic ones, and the design for a new deposition system currently being built at the Daresbury Laboratories.