| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Weatherup, Rs
University of Oxford
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (28/28 displayed)
- 2024The Role of Salt Concentration in Stabilizing Charged Ni-Rich Cathode Interfaces in Li-ion Batteries
- 2024Removal and Reoccurrence of LLZTO Surface Contaminants under Glovebox Conditionscitations
- 2023Effect of current density on the solid electrolyte interphase formation at the lithium∣Li6PS5Cl interfacecitations
- 2022Gently does it!: in situ preparation of alkali metal–solid electrolyte interfaces for photoelectron spectroscopycitations
- 2022Effect of current density on the solid electrolyte interphase formation at the lithium∣Li6PS5Cl interfacecitations
- 2022In situ and operando characterisation of Li metal – Solid electrolyte interfacescitations
- 2022Electrolyte reactivity at the charged Ni-rich cathode interface and degradation in Li-ion batteriescitations
- 2022Electrolyte Reactivity at the Charged Ni-Rich Cathode Interface and Degradation in Li-Ion Batteries.
- 2022Electronic interactions and stability issues at the copper-graphene interface in air and in alkaline solution under electrochemical controlcitations
- 2020Understanding metal organic chemical vapour deposition of monolayer WS2: the enhancing role of au substrate for simple organosulfur precursorscitations
- 2020The origin of chemical inhomogeneity in garnet electrolytes and its impact on the electrochemical performancecitations
- 2020Graphene-passivated nickel as an efficient hole-injecting electrode for large area organic semiconductor devicescitations
- 2020Understanding metal organic chemical vapour deposition of monolayer WS<sub>2</sub>: the enhancing role of Au substrate for simple organosulfur precursors.
- 2019Reactive intercalation and oxidation at the buried graphene-germanium interface
- 2018Compressive Behavior and Failure Mechanisms of Freestanding and Composite 3D Graphitic Foamscitations
- 2018Insulator-to-Metallic Spin-Filtering in 2D-Magnetic Tunnel Junctions Based on Hexagonal Boron Nitridecitations
- 2017Chemical vapour deposition of freestanding sub-60 nm graphene gyroidscitations
- 2017Low temperature growth of fully covered single-layer graphene using a CoCu catalystcitations
- 2016In Situ Observations of Phase Transitions in Metastable Nickel (Carbide)/Carbon Nanocompositescitations
- 2016In Situ Graphene Growth Dynamics on Polycrystalline Catalyst Foilscitations
- 2016Time Evolution of the Wettability of Supported Graphene under Ambient Air Exposurecitations
- 2015Protecting nickel with graphene spin-filtering membranescitations
- 2015Spatial variability in large area single and few-layer CVD graphene
- 2014The role of the sp2:sp3 substrate content in carbon supported nanotube growthcitations
- 2014The influence of intercalated oxygen on the properties of graphene on polycrystalline Cu under various environmental conditionscitations
- 2014Low temperature growth of carbon nanotubes on tetrahedral amorphous carbon using Fe-Cu catalystcitations
- 2014Nitrogen controlled iron catalyst phase during carbon nanotube growthcitations
- 2012The phase of iron catalyst nanoparticles during carbon nanotube growthcitations
Places of action
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article
Understanding metal organic chemical vapour deposition of monolayer WS<sub>2</sub>: the enhancing role of Au substrate for simple organosulfur precursors.
Abstract
We find that the use of Au substrate allows fast, self-limited WS2 mono-layer growth using a simple sequential exposure pattern of low cost, low toxicity precursors, namely tungsten hexacarbonyl and dimethylsulfide (DMS). We use this model reaction system to fingerprint the technologically important metal organic chemical vapour deposition process by operando X-ray photoelectron spectroscopy (XPS) to address the current lack of understanding of the underlying fundamental growth mechanisms for WS2 and related transition metal dichalcogenides. Au effectively promotes the sulfidation of W with simple organosulfides, enabling WS2 growth with low DMS pressure (<1 mbar) and a suppression of carbon contamination of as-grown WS2, which to date has been a major challenge with this precursor chemistry. Full WS2 coverage can be achieved by one exposure cycle of 10 minutes at 700°C. We discuss our findings in the wider context of previous literature on heterogeneous catalysis, 2D crystal growth, and overlapping process technologies such as atomic layer deposition (ALD) and direct metal conversion, linking to future integrated manufacturing processes for transition metal dichalcogenide layers.