| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Oladijo, O. P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024Sputtering of high entropy alloys thin filmscitations
- 2023The Water Absorption and Thermal Properties of Green Pterocarpus Angolensis (Mukwa)-Polylactide Compositescitations
- 2022The mechanical properties of alkali and laccase treated pterocarpus angolensis (mukwa)-polylactic acid (PLA) compositescitations
- 2020Advances in powder-based technologies for production of high-performance sputtering targetscitations
- 2020Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films
- 2020Morphological investigation and mechanical behaviour of agrowaste reinforced aluminium alloy 8011 for service life improvementcitations
- 2020A multifractal study of al thin films prepared by rf magnetron sputteringcitations
- 2020Creep behaviour and adhesion properties of tic thin film coating grown by rf magnetron sputtering
- 2019Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis
- 2019Effect of processing technique on the mechanical properties of a functionalized superhydrophobic silane
- 2019Synchrotron radiation characterization of magnetron sputtered WC-Co thin films on mild steel substrate
- 2019Effect of varying low substrate temperature on sputtered aluminium filmscitations
- 2019Characterization of Hydrophobic Silane Film Deposited on AISI 304 Stainless Steel for Corrosion Protectioncitations
- 2018Atomic force microscopy analysis of surface topography of pure thin aluminum filmscitations
- 2018A review of finite element modelling of nanoindentation and micro-scratch techniques in characterizing thin films
Places of action
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article
Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films
Abstract
<p>Control and manipulation of residual stresses in thin films is a key for attaining coatings with high mechanical and tribological performance. It is therefore imperative to have reliable residual stress measurements methods to further understand the dynamics involved. The sin2ψ method of X-ray diffraction was used to investigate the residual stresses on the tungsten carbide cobalt thin films deposited on a mild steel surface to understand the how the deposition parameters influence the generation of residual stresses within the substrate surface. X-ray spectra of the surface revealed an amorphous phase of the thin film therefore the stress measured was of the substrate surface and the effects of sputtering parameters on residual stress were analysed. Compressive stresses were identified within all samples studied. The results reveal that as the sputtering parameters are varied, the residual stresses also change. Optimum deposition parameters in terms of residual stresses were suggested.</p>