| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Oladijo, O. P.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024Sputtering of high entropy alloys thin filmscitations
- 2023The Water Absorption and Thermal Properties of Green Pterocarpus Angolensis (Mukwa)-Polylactide Compositescitations
- 2022The mechanical properties of alkali and laccase treated pterocarpus angolensis (mukwa)-polylactic acid (PLA) compositescitations
- 2020Advances in powder-based technologies for production of high-performance sputtering targetscitations
- 2020Influence of deposition parameters on the residual stresses of WC-Wo sputtered thin films
- 2020Morphological investigation and mechanical behaviour of agrowaste reinforced aluminium alloy 8011 for service life improvementcitations
- 2020A multifractal study of al thin films prepared by rf magnetron sputteringcitations
- 2020Creep behaviour and adhesion properties of tic thin film coating grown by rf magnetron sputtering
- 2019Exploring the effect of rf power in sputtering of aluminum thin films-a microstructure analysis
- 2019Effect of processing technique on the mechanical properties of a functionalized superhydrophobic silane
- 2019Synchrotron radiation characterization of magnetron sputtered WC-Co thin films on mild steel substrate
- 2019Effect of varying low substrate temperature on sputtered aluminium filmscitations
- 2019Characterization of Hydrophobic Silane Film Deposited on AISI 304 Stainless Steel for Corrosion Protectioncitations
- 2018Atomic force microscopy analysis of surface topography of pure thin aluminum filmscitations
- 2018A review of finite element modelling of nanoindentation and micro-scratch techniques in characterizing thin films
Places of action
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article
Advances in powder-based technologies for production of high-performance sputtering targets
Abstract
<p>The sputtering method has been extensively adopted for the production of high-performance thin films and coatings. This can be attributed to its versatility and flexibility, which allows easier tailoring of the properties and characteristics of the sputtered films and coatings for the desired application and performance. Contrary to thermal spray and chemical techniques, sputtering can be performed at room temperature for a wide range of targets, thus overcoming the challenges, such as residual stresses and degradation of the substrates, associated with higherature processes. The most important aspect of the sputtering is the target from which the thin film material is derived. The quality of the target determines the properties and performance of the resulting film and coating. Published data reveal that the quality of the targets depends mainly on the method of production. Although different manufacturing techniques have been used to produce these targets, consolidation of powders has been shown to provide outstanding results. The production of these targets through powder metallurgy depends on the compaction or sintering methods and associated processing parameters. With the increasing demand for high-performance thin films and coatings, such as high-entropy alloy films, the quality of the targets used for sputtering is crucial for application in various fields that include medical, electronics, and energy. In this article, progress on the powder metallurgy on the manufacturing of sputtering targets is detailed. Advances in various powder technologies, process parameters, and conditions, and their interrelationships with properties and performance of targets and sputtered thin films will be discussed, synthesized, and general/specific trends will be derived. This article will serve as a resource for metallurgists in the optimization and development of advanced targets for industry 4.0.</p>