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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Cassan, Eric
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (28/28 displayed)
- 2023Controlling the Modal Confinement in Silicon Nanophotonic Waveguides through Dual‐Metamaterial Engineeringcitations
- 2022Heterogeneous Integration of Doped Crystalline Zirconium Oxide for Photonic Applicationscitations
- 2021Enhanced thermal stability of Ni/GeSn system using pre-amorphization by implantationcitations
- 2020Erbium-doped oxide for optical gain on hybrid silicon photonics platforms (Student Paper)
- 202040 Gbps heterostructure germanium avalanche photo receiver on a silicon chipcitations
- 202040 Gbps heterostructure germanium avalanche photo receiver on a silicon chipcitations
- 2020Third Order Nonlinear Optical Susceptibility of Crystalline Oxide Yttria-Stabilized Zirconiacitations
- 2020Impact and behavior of Sn during the Ni/GeSn solid-state reactioncitations
- 2019Towards optical amplification in complex functional oxides: exploring optical gain in erbium-doped yttria-stabilized zirconia waveguidescitations
- 2019Erbium-doped Yttria-stabilized Zirconia thin layers for photonic applications
- 2019Nonlinear third order silicon photonics enabled by dispersion and subwavelength engineeringcitations
- 2019Nonlinear third order silicon photonics enabled by dispersion and subwavelength engineeringcitations
- 2019Effects of alloying elements (Pt or Co) on nickel-based contact technology for GeSn layerscitations
- 2018High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applicationscitations
- 2018High-quality crystalline yttria-stabilized-zirconia thin layer for photonic applicationscitations
- 2018Nonlinear optical properties of integrated GeSbS chalcogenide waveguidescitations
- 2017Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2017Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2017Third Order Nonlinear Properties of GeSbS Chalcogenide Waveguides (poster)
- 2017Linear and Third Order Nonlinear Optical Properties of GeSbS Chalcogenide Integrated Waveguides (Orale)citations
- 2016Integration of Carbon Nanotubes in Silicon Strip and Slot Waveguide Micro-Ring Resonatorscitations
- 2016Functional oxides on Silicon and Sapphire substrates for photonic applications
- 2016Coupling of semiconductor carbon nanotubes emission with silicon photonic microring resonators
- 2016Oxides on Silicon and Sapphire substrates for photonic applications
- 2016Oxides on Silicon and Sapphire substrates for photonic applications
- 2016Integration of carbon nanotubes in slot waveguides (Conference Presentation)
- 2014Investigation of the separate optical nonlinear contributions of the core and cladding materials of silicon photonics slotted waveguides (Poster)
- 2010Carrier depletion based silicon optical modulatorscitations
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article
40 Gbps heterostructure germanium avalanche photo receiver on a silicon chip
Abstract
Photodetectors are cornerstone components in integrated optical circuits and are essential for applications underlying modern science and engineering. Structures harnessing conventional crystalline materials are typically at the heart of such devices. In particular, group-IV semiconductors such as silicon and germanium open up more possibilities for high-performing on-chip photodetection thanks to their favorable electrical and optical properties at near-infrared wavelengths and processing compatibility with modern chip manufacturing. However, scaling the performance of silicon-germanium photodetectors to technologically relevant levels and benefiting from improved speed, reduced driving bias, enhanced sensitivity, and lowered power consumption arguably remains key for densely integrated photonic links in mainstream shortwave infrared optical communications. Here we report on a reliable 40 Gbps direct detection of chip-integrated silicon-germanium avalanche p-in photo receiver driven with low-bias supplies at 1.55 µm wavelength. The avalanche photodetection scheme calls upon fabrication steps commonly used in complementary metal-oxide-semiconductor foundries, alleviating the need for complex epitaxial wafer structures and/or multiple ion implantation schemes. The photo receiver exhibits an internal multiplication gain of 120, a high gain-bandwidth product up to 210 GHz, and a low effective ionization coefficient of ∼0.25. Robust and stable photodetection at 40 Gbps of on-off keying modulation is achieved at low optical input powers, without any need for receiver electronic stages. Simultaneously, compact avalanche p-in photodetectors with submicrometric heterostructures promote error-free operation at transmission bit rates of 32 Gbps and 40 Gbps, with power sensitivities of −12.8 dBm and −11.2 dBm, respectively (for 10 −9 error rate and without error correction coding during use). Such a performance in an on-chip avalanche photodetector is a significant step toward large-scale integrated optoelectronic systems. These achievements are promising for use in data center networks, optical interconnects, or quantum information technologies.