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Lafleur, Gael
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Publications (8/8 displayed)
- 2019Controlled Oxidation of III-V Semiconductors for Photonic Devices
- 2018Anisotropy in the wet thermal oxidation of AlGaAs: influence of process parameterscitations
- 2018Modelling anisotropic lateral oxidation from circular mesascitations
- 2018Coupled-mode analysis of vertically-coupled AlGaAs/AlOx microdisk resonatorscitations
- 2017Anisotropic oxidation of circular mesas for complex confinement in photonic devices: Experiments and modelling
- 2016III-V-semiconductor vertically-coupled whispering-gallery mode resonators made by selective lateral oxidation
- 2015Vertically Coupled Microdisk Resonators Using AlGaAs/AlOx Technologycitations
- 2015AlOx/AlGaAs technology for multi-plane integrated photonic devices
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article
Anisotropy in the wet thermal oxidation of AlGaAs: influence of process parameters
Abstract
The crystallographic anisotropy of the lateral selective thermal oxidation of AlGaAs alloys is experimentally studied. The anisotropic behavior of this oxidation process, used primarily for building a lateral confinement in vertical surface emitting lasers (VCSEL), is quantified by varying different process parameters and the geometrical shapes of laterally oxidized mesa structures. This experimental study aims to have a better control of the oxide aperture shape used in oxide-confined photonics devices.