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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Semenova, Elizaveta
Technical University of Denmark
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (15/15 displayed)
- 2024InAs(P)/InP QDs as sources of single indistinguishable photons at 1.55 µm
- 2024Experimental realization of deep sub-wavelength confinement of light in a topology-optimized InP nanocavitycitations
- 2024Heterogeneous integration of single InAs/InP quantum dots with the SOI chip using direct bondingcitations
- 2020Optical and electronic properties of low-density InAs/InP quantum-dot-like structures designed for single-photon emitters at telecom wavelengthscitations
- 2019Systematically Varying the Active Material Volume in a Photonic Crystal Nanolaser
- 2019Systematically Varying the Active Material Volume in a Photonic Crystal Nanolaser
- 2018Ultra-Efficient and Broadband Nonlinear AlGaAs-on-Insulator Chip for Low-Power Optical Signal Processingcitations
- 2017Mid-IR optical properties of silicon doped InPcitations
- 2016Highly doped InP as a low loss plasmonic material for mid-IR regioncitations
- 2016An Ultra-Efficient Nonlinear Platform: AlGaAs-On-Insulator
- 2013Ultrahigh-speed hybrid laser for silicon photonic integrated chips
- 2012Slow-light enhancement of spontaneous emission in active photonic crystal waveguides
- 2012Slow-light enhancement of spontaneous emission in active photonic crystal waveguides
- 2011Towards quantitative three-dimensional characterisation of InAs quantum dots
- 2011Active III-V Semiconductor Photonic Crystal Waveguidescitations
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article
Mid-IR optical properties of silicon doped InP
Abstract
InP is one of the most important materials for optoelectronics as a direct bandgap semiconductor, which can also be regarded as a low loss alternative plasmonic material for mid-infrared (mid-IR). The InP films studied in this work were grown by metal-organic vapor phase epitaxy (MOVPE). The effect of growth conditions on the optical and electrical properties of silicon doped InP (InP:Si) in the wavelength range from 3 to 40 μm was studied. The carrier concentration of up to 3.9 × 10<sup>19</sup> cm<sup>-3</sup> is achieved by optimizing the growth conditions. The dielectric function, effective mass of electrons and plasma frequency were determined by Fourier transform infrared spectroscopy (FTIR) for different carrier density levels. The plasma frequency can be tuned effectively via doping from 18.43 to 50.5 THz. Based on the experimental results, a semi-empirical formula for the plasma frequency, as a function of carrier concentration, is derived. Comparison to other semiconductors shows superior plasmonic performance of InP:Si in terms of propagation length and surface confinement.