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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Berenschot, Erwin J. W.
University of Twente
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (36/36 displayed)
- 2024Residual Stress Analysis of Thin Film Materials for Fabricating Suspended Low Stress Si3N4 Waveguides on Sapphire
- 2022Fabrication of microstructures in the bulk and on the surface of sapphire by anisotropic selective wet etching of laser-affected volumescitations
- 2022Integration of Topological Insulator Josephson Junctions in Superconducting Qubit Circuitscitations
- 2020Massive Parallel NEMS Flow Restriction Fabricated Using Self-Aligned 3D-Crystallographic Nanolithographycitations
- 2020Fabrication of millimeter-long structures in sapphire using femtosecond infrared laser pulses and selective etchingcitations
- 2019Selective area growth and stencil lithography for in situ fabricated quantum devicescitations
- 2018Three-dimensional fractal geometry for gas permeation in microchannelscitations
- 2018Conformal Electroless Nickel Plating on Silicon Wafers, Convex and Concave Pyramids, and Ultralong Nanowirescitations
- 2018Morphology of single picosecond pulse subsurface laser-induced modifications of sapphire and subsequent selective etchingcitations
- 2016Ultra-thin nanochannel-based liquid TEM cell for EELS analysis and high resolution imaging
- 2013Fabrication of 3D fractal structures using nanoscale anisotropic etching of single crystalline siliconcitations
- 2010Self-assembled three-dimensional non-volatile memoriescitations
- 2010Combining retraction edge lithography and plasma etching for arbitrary contour nanoridge fabricationcitations
- 2009Characterization of MEMS-on-tube assembly: reflow bonding of borosilicate glass (Duran ®) tubes to silicon substratescitations
- 2008Fabrication of a silicon oxide stamp by edge lithography reinforced with silicon nitride for nanoimprint lithographycitations
- 2008Monolithics silicon nano-ridge fabrication by edge lithography and wet anisotropic etching of silicon
- 2007Spreading of thin-film metal patterns deposited on nonplanar surfaces using a shadow mask micromachined in si (110)citations
- 2006Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a maskcitations
- 2006A novel surface micromachining process to fabricate AlN unimorph suspensions and its application for RF resonatorscitations
- 2005Nano-ridge fabrication by local oxidation of silicon edges with silicon nitride as a mask
- 2005Surface micromachined fabrication of piezoelectric ain unimorph suspension devices for rf resonator applications
- 2005Micromachined fountain pen as a tool for atomic force microscope-based nanoelectrochemical metal depositioncitations
- 2005Fabrication of surface micromachined ain piezoelectric microstructures and its potential apllication to rf resonators
- 2004Surface Micromachining Process for the Integration of AlN Piezoelectric Microstructures
- 2003A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactorscitations
- 2003Wet anisotropic etching for fluidic 1d nanochannelscitations
- 2002Wet anisotropic etching for fluidic 1D nanochannels
- 2002Fabrication and characterization of MEMS based wafer-scale palladium-silver alloy membranes for hydrogen separation and hydrogenation/dehydrogenation reactionscitations
- 2002Micromachined Palladium - Silver Alloy Membranes for Hydrogen Separation
- 2001Local anodic bonding of Kovar to Pyrex aimed at high-pressure, solvent-resistant microfluidic connectionscitations
- 2001Platinum patterning by a modified lift-off technique and its application in a silicon load cell
- 2001Failure mechanisms of pressurized microchannels, model, and experimentscitations
- 2001Selective Wafer Bonding by Surface Roughness Controlcitations
- 2000High resolution powder blast micromachiningcitations
- 2000Mask materials for powder blastingcitations
- 2000Characterization of platinum lift off technique
Places of action
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article
Morphology of single picosecond pulse subsurface laser-induced modifications of sapphire and subsequent selective etching
Abstract
<p>The effect of 1030nm single picosecond pulsed laser-induced modification of the bulk of crystalline sapphire using a combined process of laser amorphization and selective wet chemical etching is studied. Pulse durations of more than 1 picosecond are not commonly used for this subsurface process. We examine the effect of 7 picosecond pulses on the morphology of the unetched, as well as etched, single pulse modifications, showing the variation of shape and size when varying the pulse energy and the depth of processing. In addition, a qualitative analysis of the material transformation after irradiation is provided as well as an analysis of cracking phenomena. Finally, a calculated laser intensity profile inside sapphire, using the Point Spread Function (PSF), is compared to the shape of the modifications. This comparison is employed to calculate the intensity threshold leading to amorphization, which equals 2.5.1014 ± 0.4.1014 W/cm2.</p>