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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Gu, Min
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2014Adaptive optics enhanced direct laser writing of high refractive index gyroid photonic crystals in chalcogenide glasscitations
- 2011Generation of λ/12 nanowires in chalcogenide glassescitations
- 2011Functional three-dimensional nonlinear nanostructures in a gold ion nanocomposite
- 2011High resolution fabrication in chalcogenide glassescitations
- 2011Planar defects in three-dimensional chalcogenide glass photonic crystalscitations
- 2009As2S3 photonic crystals for spontaneous emission control of PbSeCdSe core-shell quantum dots
- 2008Observation of multiple higher-order stopgaps from three-dimensional chalcogenide glass photonic crystalscitations
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article
Adaptive optics enhanced direct laser writing of high refractive index gyroid photonic crystals in chalcogenide glass
Abstract
<p>Chiral gyroid photonic crystals are fabricated in the high refractive index chalcogenide glass arsenic trisulfide with an adaptive optics enhanced direct laser writing system. The severe spherical aberration imparted when focusing into the arsenic trisulfide is mitigated with a defocus decoupled aberration compensation technique that reduces the level of aberration that must be compensated by over an order of magnitude. The fabricated gyroids are shown to have excellent uniformity after our adaptive optics method is employed, and the transmission spectra of the gyroids are shown to have good agreement with numerical simulations that are based on a uniform and diffraction limited fabrication resolution.</p>