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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Hämäläinen, Jani Marko Antero
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Topics
Publications (20/20 displayed)
- 2020Van der Waals epitaxy of continuous thin films of 2D materials using atomic layer deposition in low temperature and low vacuum conditionscitations
- 2019How insignificant modifications of photocatalysts can significantly change their photocatalytic activitycitations
- 2018Rhenium Metal and Rhenium Nitride Thin Films Grown by Atomic Layer Depositioncitations
- 2018Atomic Layer Deposition of Rhenium Disulfidecitations
- 2016Atomic Layer Deposition of Metal Phosphates and Lithium Silicates
- 2016Atomic Layer Deposition of Iridium Thin Films Using Sequential Oxygen and Hydrogen Pulsescitations
- 2016Nucleation and conformality of iridium and iridium oxide thin films grown by atomic layer depositioncitations
- 2014Atomic Layer Deposition of Noble Metals and Their Oxidescitations
- 2013Low temperature atomic layer deposition of noble metals using ozone and molecular hydrogen as reactantscitations
- 2012Study of amorphous lithium silicate thin films grown by atomic layer depositioncitations
- 2012Lithium Phosphate Thin Films Grown by Atomic Layer Depositioncitations
- 2012Atomic layer deposited iridium oxide thin film as microelectrode coating in stem cell applicationscitations
- 2011Iridium metal and iridium oxide thin films grown by atomic layer deposition at low temperaturescitations
- 2011Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applicationscitations
- 2010pH electrode based on ALD deposited iridium oxidecitations
- 2009Metallic Ir, IrO2 and Pt Nanotubes and Fibers by Electrospinning and Atomic Layer Deposition
- 2009Study on atomic layer deposition of amorphous rhodium oxide thin filmscitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Atomic layer deposition of platinum oxide and metallic platinum thin films from Pt(acac)₂ and ozonecitations
Places of action
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article
Lithium Phosphate Thin Films Grown by Atomic Layer Deposition
Abstract
Lithium phosphate, Li3PO4, has been considered a potential electrolyte material for lithium ion batteries and CO2 sensors in particular if the films can be made dense and of high quality already at low thickness. In this work, Li3PO4 thin films were deposited by atomic layer deposition (ALD) between 225 and 350°C using trimethyl phosphate and either of the two lithium sources, namely lithium hexamethyldisilazide or lithium tert-butoxide. The deposited films showed slightly crystalline Li3PO4 structure in X-ray diffraction and the elastic recoil detection analysis confirmed this stoichiometry with some carbon and hydrogen impurities. The crystallinity and thermal stability of the films at elevated temperatures in N2 were also examined. The long term stability of the deposited Li3PO4 films under ambient air may be an issue for the applicability of these processes.