• Zadidulin, Dmitrij
• Tahmasebi, Arezoo
• Davison, Matt
• Morgan, Adam
• Shoesmith, David W.
• Behazin, Mehran

Abstract

<jats:p>Copper and copper alloys have found applications in various industries. One of the main reasons Cu and its alloys are utilized widely is that they have sufficient corrosion resistance in key environments, such as seawater and anoxic solutions; however, localized corrosion processes might occur in the presence of aggressive anions, oxygen, or an increase in solution pH. In critical applications of Cu, the susceptibility of Cu to localized corrosion, specifically pitting, must be carefully considered, as it could lead to material failure. In this study, the pitting probability of Cu in unary (sulfate) and binary (sulfate + bicarbonate) solutions was investigated using electrochemical techniques in conjunction with statistical analysis. We determined pitting probabilities based on two different defining criteria for pitting susceptibility, one based on the probability that the corrosion potential, E<jats:sub>corr</jats:sub>, could exceed the passivity breakdown potential, E<jats:sub>b</jats:sub>, and the other, a more conservative approach, based on the likelihood that Ecorr would be greater than the repassivation potential, E<jats:sub>rp</jats:sub>. The pitting probability of Cu did not change significantly with sulfate concentration at pH 8 but was found to increase with increasing [<jats:inline-formula><jats:tex-math> <?CDATA ${{{{SO}}}_{4}}^{2-}$?> </jats:tex-math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"><mml:msup><mml:msub><mml:mrow><mml:mi mathvariant="normal">SO</mml:mi></mml:mrow><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msub><mml:mrow><mml:mn>2</mml:mn><mml:mo>−</mml:mo></mml:mrow></mml:msup></mml:math><jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="jesacd606ieqn1.gif" xlink:type="simple" /></jats:inline-formula>] up to 0.005 M at pH 9 and then to decrease with a further increase in [<jats:inline-formula><jats:tex-math> <?CDATA ${{{{SO}}}_{4}}^{2-}$?> </jats:tex-math><mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" overflow="scroll"><mml:msup><mml:msub><mml:mrow><mml:mi mathvariant="normal">SO</mml:mi></mml:mrow><mml:mrow><mml:mn>4</mml:mn></mml:mrow></mml:msub><mml:mrow><mml:mn>2</mml:mn><mml:mo>−</mml:mo></mml:mrow></mml:msup></mml:math><jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="jesacd606ieqn2.gif" xlink:type="simple" /></jats:inline-formula>].</jats:p>

Topics

• impedance spectroscopy
• corrosion
• Oxygen
• copper
• susceptibility
• copper alloy