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Jolayemi, Bukola
Institute of Electronics, Microelectronics and Nanotechnology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (3/3 displayed)
- 2023High Throughput Characterization Methods at the Wafer Scale for Sputtered Films Used in Micro-Supercapacitors and Li-Ion Micro-Batteries
- 2022Sputtered (Fe,Mn)<sub>3</sub>O<sub>4</sub> Spinel Oxide Thin Films for Micro-Supercapacitorcitations
- 2022Sputtered (Fe,Mn) 3 O 4 Spinel Oxide Thin Films for Micro-Supercapacitorcitations
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article
Sputtered (Fe,Mn)<sub>3</sub>O<sub>4</sub> Spinel Oxide Thin Films for Micro-Supercapacitor
Abstract
<jats:p>The scaling up of wireless operating microelectronics for upcoming Internet of Things (IoT) applications demands high-performance micro-supercapacitors (MSCs) with corresponding high-energy and power capabilities. Indeed, this necessitates the quest for MSC’s electrode materials capable of delivering high energy density at high charge/discharge rates. Many multicationic oxides, such as spinel manganese-iron compounds, demonstrate good pseudocapacitive properties as positive electrodes in conventional supercapacitors. However, fulfilling the required fabrication techniques is a challenge for their applications in MSCs. Hence, this study, for the first time, demonstrates the successful deposition of spinel Mn-Fe thin films on a functional platinum-based current collector. The deposition is achieved in a reactive oxygen environment via reactive DC magnetron sputtering techniques and subsequently annealed ex situ at 600 °C in a nitrogen environment. The electrochemical signature in neutral 1 M Na<jats:sub>2</jats:sub>SO<jats:sub>4</jats:sub> aqueous electrolyte is comparable to those reported for spinel type Mn-Fe bulk counterparts. The areal capacitance at 10 mV.s<jats:sup>−1</jats:sup> is 15.5 mF.cm<jats:sup>−2</jats:sup> for 1 <jats:italic>μ</jats:italic>m thick film, exhibiting excellent coulombic efficiency (close to 100%) and long-term cycle stability after 10,000 cycles. Thus, the synthesis of the multicationic pseudocapacitive oxides via compatible microelectronic deposition methods has set a prospective path to achieve very high-performance MSCs for future IoT applications.</jats:p><jats:p><jats:inline-formula><jats:inline-graphic xmlns:xlink="http://www.w3.org/1999/xlink" xlink:href="jesaca050-ga.jpg" xlink:type="simple" /></jats:inline-formula></jats:p>