693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Kemell, Marianna Leena
University of Helsinki
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (47/47 displayed)
- 2024Mesoporous silica-amine beads from blast furnace slag for CO<sub>2</sub> capture applicationscitations
- 2023Functionalization of nitrogen-doped graphene quantum dotcitations
- 2023Conversion of ALD CuO Thin Films into Transparent Conductive p-Type CuI Thin Filmscitations
- 2023Atomic Layer Deposition and Pulsed Chemical Vapor Deposition of SnI2 and CsSnI3citations
- 2022Atomic layer deposition of PbCl2, PbBr2 and mixed lead halide (Cl, Br, I) PbXnY2-n thin filmscitations
- 2022Atomic Layer Deposition of CsI and CsPbI3citations
- 2020Fabrication and Characterization of Drug-Loaded Conductive Poly(glycerol sebacate)/Nanoparticle-Based Composite Patch for Myocardial Infarction Applicationscitations
- 2020Multifunctional 3D-printed patches for long-term drug release therapies after myocardial infarctioncitations
- 2020Fungal Treatment Modifies Kraft Lignin for Lignin- and Cellulose-Based Carbon Fiber Precursorscitations
- 2020Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer depositioncitations
- 2020Atomic Layer Deposition of PbS Thin Films at Low Temperaturescitations
- 2019Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and watercitations
- 2019Atomic Layer Deposition of Photoconductive Cu2O Thin Filmscitations
- 2019Atomic Layer Deposition of PbI₂ Thin Filmscitations
- 2018Conductive vancomycin-loaded mesoporous silica polypyrrole-based scaffolds for bone regenerationcitations
- 2018Atomic Layer Deposition of Zirconium Dioxide from Zirconium Tetraiodide and Ozonecitations
- 2018Atomic Layer Deposition and Performance of ZrO2-Al2O3 Thin Filmscitations
- 2018Atomic Layer Deposition and Properties of HfO2-Al2O3 Nanolaminatescitations
- 2018Integrated atomic layer deposition and chemical vapor reaction for the preparation of metal organic framework coatings for solid-phase microextraction Arrowcitations
- 2017As2S3 thin films deposited by atomic layer depositioncitations
- 2017Atomic layer deposition of tin oxide thin films from bis[bis(trimethylsilyl)amino]tin(II) with ozone and watercitations
- 2017A Multifunctional Nanocomplex for Enhanced Cell Uptake, Endosomal Escape and Improved Cancer Therapeutic Effectcitations
- 2017Atomic layer deposition-A novel method for the ultrathin coating of minitabletscitations
- 2016Electric and Magnetic Properties of ALD-Grown BiFeO3 Filmscitations
- 2016Scalable Route to the Fabrication of CH3NH3PbI3 Perovskite Thin Films by Electrodeposition and Vapor Conversion.citations
- 2016Bismuth iron oxide thin films using atomic layer deposition of alternating bismuth oxide and iron oxide layerscitations
- 2016Hydrogen sensor of Pd-decorated tubular TiO2 layer prepared by anodization with patterned electrodes on SiO2/Si substratecitations
- 2015Thermal and Mechanical Properties of Sustainable Composites Reinforced with Natural Fiberscitations
- 2015Atomic layer deposition of zirconium dioxide from zirconium tetrachloride and ozonecitations
- 2015Conduction and stability of holmium titanium oxide thin films grown by atomic layer depositioncitations
- 2014Continuous-Wave Laser Annealing of a Si/SiO2 Superlatticecitations
- 2012Preparation of regularly structured nanotubular TiO2 thin films on ITO and their modification with thin ALD-grown layerscitations
- 2010High temperature atomic layer deposition of Ruthenium from N,N-dimethyl-1-ruthenocenylethylaminecitations
- 2010Atomic layer deposition and characterization of zirconium oxide-erbium oxide nanolaminatescitations
- 2010Selective-area atomic layer deposition using poly(vinyl pyrrolidone) as a passivation layercitations
- 2009The preparation of reusable magnetic and photocatalytic composite nanofibers by electrospinning and atomic layer depositioncitations
- 2009Atomic layer deposition of iridium thin films by consecutive oxidation and reduction stepscitations
- 2008Atomic layer deposition of iridium oxide thin films from Ir(acac)₃ and ozonecitations
- 2008Coating of highly porous fiber matrices by atomic layer depositioncitations
- 2008Selective-area atomic layer deposition using poly(methyl methacrylate) films as maskcitations
- 2007Hollow inorganic nanospheres and nanotubes with tunable wall thicknesses by atomic layer deposition on self-assembled polymeric templatescitations
- 2007Atomic layer deposition in nanotechnology applications
- 2007Ruthenium/aerogel nanocomposites via atomic layer depositioncitations
- 2007Degradation effects in TlBr single crystals under prolonged bias voltagecitations
- 2006Atomic layer deposition of ferroelectric bismuth titanate Bi4Ti3O12 thin filmscitations
- 2005Aging of electroluminescent ZnScitations
- 2005Thin film deposition methods for CulnSe(2) solar cellscitations
Places of action
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article
High temperature atomic layer deposition of Ruthenium from N,N-dimethyl-1-ruthenocenylethylamine
Abstract
Ruthenium thin films were grown by atomic layer deposition from N,N-dimethyl-1-ruthenocenylethylamine precursor. The growth was examined in the substrate temperature range of 325-500 degrees C. The growth rate increased with the substrate temperature but was quite stable between 400 and 450 degrees C. The films typically consisted of polycrystalline hexagonal ruthenium metal with a resistivity in the range of 10-20 mu Omega cm when the film thickness was 10 nm and above. A resistivity of 49 mu Omega cm could be achieved in the film as thin as 4 nm. Measurements on Al/Al2O3/Ru metal-insulator-metal (MIM) capacitors with Ru films as metal electrodes revealed a capacitive voltage behavior typical of MIM structures and appreciably high breakdown voltages. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3251285] All rights reserved.