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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Lytvyn, Peter
V.E. Lashkaryov Institute of Semiconductor Physics
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (4/4 displayed)
- 2023Electron‐Assisted Deposition‐Polymerization in Vacuum of Polymethines with Terminal Allyl Groupcitations
- 2021Fluoropolymer Film Formation by Electron Activated Vacuum Depositioncitations
- 2021Impact of low energy ion beams on the properties of rr-P3HT films
- 2020Graphitic Nanoporous Carbon Thin Films: Fabrication Method, Structural, Electrical and Gas Sensor Propertiescitations
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article
Graphitic Nanoporous Carbon Thin Films: Fabrication Method, Structural, Electrical and Gas Sensor Properties
Abstract
<jats:p>New method (magnetron plasma enhanced CVD) is suggested to obtain record values of porosity of thin carbon films. Further high temperature annealing results in graphitization of the carbon film and reduction of their resistivity down to 10<jats:sup>2</jats:sup> Ohm×cm. Plasma treatment in forming gas leads to modification both of a surface and bulk thin nanoporous graphitic film that decreases resistivity of the film, reduces sensor sensitivity to water vapour and enhances sensor sensitivity to ammonia gas.</jats:p>