• Pollnau, M.
• Crunteanu, A.
• Hoffmann, P.
• Eason, Robert W.
• Salathé, R. P.
• Hibert, C.
• Shepherd, David P.
• Jänchen, G.

Abstract

We report on the fabrication of Ti:sapphire channel waveguides. Such channel waveguides are of interest, e.g., as low-threshold tunable lasers. We investigated several structuring methods including ion beam implantation followed by wet chemical etching strip loading by polyimide spin coating and subsequent laser micro-machining, direct laser ablation or reactive ion etching through laser-structured polyimide contact masks. The later two methods result in ribs having different widths and heights up to ~5 µm. By reactive ion etching we have obtained channel waveguides with strong confinement of the Ti:sapphire fluorescence emission.

Topics

• spin coating
• laser ablation
• plasma etching