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Govindassamy, Goby
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document
Sub-ps 1030 nm laser-induced damage threshold evaluation of pulsed-laser deposited sesquioxides and magnetron-sputtered metal oxide optical coatings
Abstract
<p>Crystalline sesquioxide films (Sc<sub>2</sub>O<sub>3</sub>, Y<sub>2</sub>O<sub>3</sub>, Lu<sub>2</sub>O<sub>3</sub>) produced by pulsed-laser deposition were examined for laser damage resistance with pulses of 500 fs duration, at a wavelength of 1030 nm and at a 10 Hz repetition rate. Comparable tests were performed with amorphous magnetron-sputtered thin films (SiO<sub>2</sub>, HfO<sub>2</sub>, Nb<sub>2</sub>O<sub>5</sub>). We found the laser-induced damage thresholds of the sesquioxides are close to those of HfO<sub>2</sub> in the multi-pulse test regime. The results are the basis for designs of damage resistant reflective components used in ultrashort-pulse lasers.</p>