People | Locations | Statistics |
---|---|---|
Naji, M. |
| |
Motta, Antonella |
| |
Aletan, Dirar |
| |
Mohamed, Tarek |
| |
Ertürk, Emre |
| |
Taccardi, Nicola |
| |
Kononenko, Denys |
| |
Petrov, R. H. | Madrid |
|
Alshaaer, Mazen | Brussels |
|
Bih, L. |
| |
Casati, R. |
| |
Muller, Hermance |
| |
Kočí, Jan | Prague |
|
Šuljagić, Marija |
| |
Kalteremidou, Kalliopi-Artemi | Brussels |
|
Azam, Siraj |
| |
Ospanova, Alyiya |
| |
Blanpain, Bart |
| |
Ali, M. A. |
| |
Popa, V. |
| |
Rančić, M. |
| |
Ollier, Nadège |
| |
Azevedo, Nuno Monteiro |
| |
Landes, Michael |
| |
Rignanese, Gian-Marco |
|
Mitchell, Arnan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (14/14 displayed)
- 2021Fringe analysis approach for imaging surface undulations on technical surfacescitations
- 2020Optical frequency comb generation using low stress CMOS compatible reactive sputtered silicon nitride waveguidescitations
- 2020Optical frequency comb generation using low stress reactive sputtered silicon nitride waveguides
- 2019CMOS-compatible, plasma beam assisted reactive magnetron sputtered silicon nitride films for photonic integrated circuits
- 2019Post processing dispersion trimming for on-chip mid-infrared supercontinuum generation
- 2019Low stress, anomalous dispersive silicon nitride waveguides fabricated by reactive sputtering
- 2019Low loss CMOS-compatible silicon nitride photonics utilizing reactive sputtered thin filmscitations
- 2017Liquid metal enabled microfluidicscitations
- 2017Compact Brillouin devices through hybrid integration on siliconcitations
- 2015Creation of Liquid Metal 3D Microstructures Using Dielectrophoresiscitations
- 2014Spectral and angular characteristics of dielectric resonator metasurface at optical frequenciescitations
- 2013Liquid metal marblescitations
- 2013Liquid metal marblescitations
- 2013Electrochemically induced actuation of liquid metal marblescitations
Places of action
Organizations | Location | People |
---|
document
Optical frequency comb generation using low stress CMOS compatible reactive sputtered silicon nitride waveguides
Abstract
<p>Photonic chip based Kerr frequency combs are transforming diverse applications including spectroscopy, telecommunication, signal processing and metrology among others. Integrated silicon nitride (SiN) waveguides with anomalous dispersion have the potential to bring practical nonlinear optics to mainstream photonic integrated circuits; however, high stress and high processing temperatures for SiN deposited by low pressure chemical vapour deposition (LPCVD) remain an obstacle to mass adoption. We successfully demonstrate fully CMOS-compatible high confinement SiN microring resonators based on reactive sputtering thin-films at a maximum processing temperature of 400°C. We deposit 0.85 µm thick SiN thin-films with a low stress value of 41.5 MPa and bulk material losses of 0.3 dB/cm. Linear waveguides losses of 0.7 dB/cm (Q<sub>int</sub>= 4.9 × 10<sup>5</sup>) and 0.5 dB/cm (Q<sub>int</sub>= 6.6 × 10<sup>5</sup>) have been achieved at 1560 nm and 1580 nm, respectively. We characterised the nonlinear properties of the waveguides and measured a nonlinear coefficient of γ = 2.1 W<sup>-1</sup> m<sup>-1</sup> and a nonlinear refractive index n<sub>2</sub> of 5.6 × 10<sup>-19</sup> m<sup>2</sup> W<sup>-1</sup>. Modulation-instability (MI) optical frequency combs are observed by pumping a 120 µm radius microring resonator at 1560 nm with an estimated on-chip pump power of 850 mW, showing a native FSR spaced frequency comb covering a >250 nm wide spectral range.</p>