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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Szmidt, Jan
Warsaw University of Technology
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (16/16 displayed)
- 2024The Preparation and Properties of a Hydrogen-Sensing Field-Effect Transistor with a Gate of Nanocomposite C-Pd Film
- 2020Hydrogen sensor based on field effect transistor with C-Pd layercitations
- 2020Field effect transistor with thin AlOxNy film as gate dielectric
- 2019Technology and characterization of ISFET structures with graphene membranecitations
- 2019Influence of annealing on electronic properties of thin AlN films deposited by magnetron sputtering method on silicon substratescitations
- 2018Capillary Sensors with UV-Forced Degradation and Fluorescence Reading of Chemical Stability and Polycyclic Aromatic Hydrocarbons Presence in Diesel Fuels
- 2018Influence of Atomic Layer Deposition Temperature on the Electrical Properties of Al/ZrO2/SiO2/4H‐SiC Metal‐Oxide Semiconductor Structurescitations
- 2015Depth Profile Analysis of Phosphorus Implanted SiC Structurescitations
- 2013Application of scanning microscopy to study correlation between thermal properties and morphology of BaTiO3 thin filmscitations
- 2013Plasma etching of aluminum nitride thin films prepared by magnetron sputtering method
- 2013Characterization of thin Gd2O3 magnetron sputtered layers citations
- 2011Electronic properties of BaTiO<sub>3</sub>/4H-SiC interfacecitations
- 2009Electric Characterization and Selective Etching of Aluminum Oxidecitations
- 2007Barium titanate thin films plasma etch rate as a function of the applied RF power and Ar/CF<inf>4</inf> mixture gas mixing ratiocitations
- 2006Optical fiber switch for sensor networks: design principles
- 2001Electronic properties of unipolar heterostructures amorphous carbon diamond - amorphous carbon
Places of action
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booksection
Technology and characterization of ISFET structures with graphene membrane
Abstract
Graphene due to its properties, such as high sensitivity and biocompatibility finds application in instruments that are used to cooperation with organic substances. At the same time, from the point of view of sensory devices, it is a material with high absorption potential that is able to improve sensitivity and selectivity of these devices. Another benefit of graphene application may be to use its properties in connection with ISFET – Ion Sensitive Field Effect Transistor, which operation principle is based mostly on detection of changes in hydrogen ions concentration. ISFET transistors ale produced in MOS technology, the difference between them and classic MOSFET (Metal-OxideSemiconductor Field Effect Transistor) structures is gate area, where gate metallization was replaced with reference electrode submerged in solution applied in this area. Properties of the solution determine transistor’s action. It is possible to make modifications in gate area of the structure which effects in changes of transistor’s properties. Example of such a modification may be application of graphene layer, which properties may significantly improve detecting capabilities of ISFET devices. For the needs of the research described in this work, graphene was deposited in gate area of transistors through transfer from cooper and germanium surfaces. To check correctness of ISFETs with graphene layer work, current – voltage characteristics of them were determined. Standard I-V characteristics with SiO2 as gate dielectric were compared with these where gate area was enriched with a graphene layer. Structures with graphene mostly worked properly. Thanks to the results presented in this work, it is possible to carry out further experiments using this structures and organic substances.