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| Naji, M. |
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Śmietana, Mateusz Jakub
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Topics
Publications (3/3 displayed)
- 2016Properties of silicon nitride thin overlays deposited on optical fibers – effect of fiber suspension in radio frequency plasma-enhanced chemical vapor deposition reactorcitations
- 2015Sensing properties of periodic stack of nano-films deposited with various vapor-based techniques on optical fiber end-facecitations
- 2014Effect of Sample Elevation in Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) Reactor on Optical Properties and Deposition Rate of Silicon Nitride Thin Filmscitations
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booksection
Sensing properties of periodic stack of nano-films deposited with various vapor-based techniques on optical fiber end-face
Abstract
This work presents a study on sensing capabilities of stacks of nano-films deposited on a single-mode optical fiber end-faces. The stacks consist of periodically interchanging thin-film layers of materials characterized by different refractive indices (RI). The number of layers is relatively small to encourage light-analyte interactions. Two different deposition techniques are considered, i.e., radio frequency plasma enhanced chemical vapor deposition (RF PECVD) and physical vapor deposition by reactive magnetron sputtering (RMS). The former technique allows to deposit stacks consisting of silicon nitride nano-films, and the latter is well suited for aluminum and titanium oxides alternating layers. The structures are tested for external RI and temperature measurements. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.