| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Bundaleski, N.
Universidade Nova de Lisboa
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (8/8 displayed)
- 2023Amorphous carbon thin filmscitations
- 2020Free-standing N-Graphene as conductive matrix for Ni(OH)2 based supercapacitive electrodescitations
- 2019Nanocomposite thin films based on Au-Ag nanoparticles embedded in a CuO matrix for localized surface plasmon resonance sensingcitations
- 2018Development of Au/CuO nanoplasmonic thin films for sensing applicationscitations
- 2016Surface modifications on as-grown boron doped CVD diamond films induced by the B2O3-ethanol-Ar systemcitations
- 2013Study of SEY degradation of amorphous carbon coatings
- 2013Increase of secondary electron yield of amorphous carbon coatings under high vacuum conditionscitations
- 2012Secondary electron emission yield (SEY) in amorphous and graphitic carbon films prepared by PLDcitations
Places of action
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article
Amorphous carbon thin films
Abstract
Amorphous carbon (a-C) films, having low secondary electron yield (SEY), are used at CERN to suppress electron multipacting in the beam pipes of particle accelerators. It was already demonstrated that hydrogen impurities increase the SEY of a-C films. In this work, a systematic characterization of a set of a-C coatings, deliberately contaminated by deuterium during the magnetron sputtering deposition, by scanning electron microscopy, ion beam analysis, secondary ion mass spectrometry, and optical absorption spectroscopy was performed to establish a correlation between the hydrogen content and the secondary electron emission properties. In parallel, the mechanisms of contamination were also investigated. Adding deuterium allows resolving the contributions of intentional and natural contamination. The results enabled us to quantify the relative deuterium/hydrogen (D/H) amounts and relate them with the maximum SEY (SEYmax). The first step of incorporation appears to be formation of D/H atoms in the discharge. An increase in both the flux of deposited carbon atoms and the discharge current with a D2 fraction in the gas discharge can be explained by target poisoning with deuterium species followed by etching of CxDy clusters, mainly by physical sputtering. For overall relative D/H amounts between 11% and 47% in the discharge gas, the SEYmax increases almost linearly from 0.99 to 1.38. An abrupt growth of SEYmax from 1.38 to 2.12 takes place in the narrow range of D/H relative content of 47%-54%, for which the nature of the deposited films changes to a polymer-like layer.