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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Kononenko, Denys |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Muller, Hermance |
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Kočí, Jan | Prague |
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Šuljagić, Marija |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Blanpain, Bart |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Rignanese, Gian-Marco |
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Chen, Hao
Politecnico di Milano
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (10/10 displayed)
- 2023Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputteringcitations
- 2021Insight into the Solid Electrolyte Interphase Formation in Bis(fluorosulfonyl)Imide Based Ionic Liquid Electrolytescitations
- 2021Powder Bed Fusion of nickel-based superalloys: A reviewcitations
- 2021Near-IR transparent conductive amorphous tungsten oxide thin layers by non-reactive radio-frequency magnetron sputteringcitations
- 2020‘Unit cell’ type scan strategies for powder bed fusioncitations
- 2020Unveiling the Working Mechanism of Graphene Bubble Film/Silicon Composite Anodes in Li-Ion Batteries: From Experiment to Modelingcitations
- 2018Utilizing room temperature liquid metals for mechanically robust silicon anodes in lithium-ion batteriescitations
- 2013The effect of prior ferrite formation on bainite and martensite transformation kinetics in advanced high-strength steelscitations
- 2013Application of interrupted cooling experiments to study the mechanism of bainitic ferrite formation in steelscitations
- 2012Analysis of the stagnant stage in diffusional phase transformations starting from austenite-ferrite mixturescitations
Places of action
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article
Study of process parameters and characteristics properties of W coatings deposited by rf plasma sputtering
Abstract
<jats:p>Tungsten coatings were deposited on silicon substrates by radio frequency (rf) magnetron sputtering from a metallic target in Ar atmosphere. The process parameters during the sputtering process were evaluated by a Langmuir probe, particularly, the electron density and electron temperature were measured by changing the rf power and gas pressure. The morphological and structural properties of the coatings were studied as a function of the pressure. Significant correlations were found between process parameters and characteristics properties of W coatings. The influence of deposition parameters on electrical properties was investigated. The electrical resistivity of the coatings was increased from 1.3 × 10−6 to 3 × 10−5 Ω m as the pressure increased as well.</jats:p>