| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Petrov, Ivan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (55/55 displayed)
- 2024Exploring the thermal behavior and diffusive functionality of structural defects and phase boundaries in near-stoichiometric chromium diborides by <i>in situ</i> scanning transmission electron microscopy
- 2024Exploring the thermal behavior and diffusive functionality of structural defects and phase boundaries in near-stoichiometric chromium diborides by in situ scanning transmission electron microscopy
- 2023Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiationcitations
- 2023Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditionscitations
- 2023Growth and stability of epitaxial zirconium diboride thin films on silicon (111) substratecitations
- 2023Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heatingcitations
- 2023Discovery of Guinier-Preston zone hardening in refractory nitride ceramicscitations
- 2022Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumptioncitations
- 2022Microstructure, mechanical, and corrosion properties of Zr1-xCrxBy diboride alloy thin films grown by hybrid high power impulse/DC magnetron co-sputteringcitations
- 2022On the nature of planar defects in transition metal diboride line compoundscitations
- 2021Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heatingcitations
- 2021Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiationcitations
- 2021Age hardening in superhard ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2021Towards energy-efficient physical vapor deposition : Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heatingcitations
- 2021Systematic compositional analysis of sputter-deposited boron-containing thin filmscitations
- 2020The influence of pressure and magnetic field on the deposition of epitaxial TiBx thin films from DC magnetron sputteringcitations
- 2020Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heatingcitations
- 20203D-to-2D morphology manipulation of sputter-deposited nanoscale silver films on weakly interacting substrates via selective nitrogen deployment for multifunctional metal contactscitations
- 2020Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Alcitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Mechanical properties of VMoNO as a function of oxygen concentration: Toward development of hard and tough refractory oxynitridescitations
- 2019Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heatingcitations
- 2019A review of the intrinsic ductility and toughness of hard transition-metal nitride alloy thin filmscitations
- 2018Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N-2citations
- 2018Elastic properties and plastic deformation of TiC- and VC-based alloyscitations
- 2018Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin filmscitations
- 2018Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputteringcitations
- 2018Low temperature (T-s/T-m < 0.1) epitaxial growth of HfN/MgO(001) via reactive HiPIMS with metal-ion synchronized substrate biascitations
- 2017Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Arcitations
- 2017Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiationcitations
- 2017Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Arcitations
- 2016Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivitycitations
- 2015Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS depositioncitations
- 2015Dynamic and structural stability of cubic vanadium nitridecitations
- 2015Control of Ti1-xSixN nanostructure via tunable metal-ion momentum transfer during HIPIMS/DCMS co-depositioncitations
- 2014Elastic constants, Poisson ratios, and the elastic anisotropy of VN(001), (011), and (111) epitaxial layers grown by reactive magnetron sputter depositioncitations
- 2014Novel strategy for low-temperature, high-rate growth of dense, hard, and stress-free refractory ceramic thin filmscitations
- 2014Structure evolution and Properties of TiAlCN/VCN Coatings Deposited by Reactive HIPIMScitations
- 2014Ab-initio and classical molecular dynamics simulations of N2 desorption from TiN(001) surfacescitations
- 2014X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96citations
- 2014Si incorporation in Ti1-xSixN films grown on TiN(001) and (001)-faceted TiN(111) columnscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.64citations
- 2012The Si 3 N 4 /TiN interface: 3. Si 3 N 4 /TiN(001) grown with a ―150 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 6. Si/TiN(001) grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 5. TiN/Si 3 N 4 grown and analyzed in situ using angle-resolved X-ray photoelectron spectroscopy
- 2012The Si 3 N 4 /TiN interface: 4. Si 3 N 4 /TiN(001) grown with a ―250 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 2. Si 3 N 4 /TiN(001) grown with a ―7 V substrate bias and analyzed in situ using angle-resolved X-ray photoelectron spectroscopycitations
- 2012The Si 3 N 4 /TiN interface: 7. Ti/TiN(001) grown and analyzed in situ using X-ray photoelectron spectroscopycitations
- 2012Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate biascitations
- 2012Configurational disorder effects on adatom mobilities on Ti1-xAlxN(001) surfaces from first principlescitations
- 2011Electronic structure of the SiN x /TiN interface: a model system for superhard nanocompositescitations
- 2010The Formation and Utility of Sub-Angstrom to Nanometer-Sized Electron Probes in the Aberration-Corrected Transmission Electron Microscope at the University of Illinoiscitations
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article
Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heating
Abstract
Hybrid high-power impulse and dc magnetron co-sputtering (HiPIMS/DCMS) with substrate bias synchronized to the high mass metal-ion fluxes was previously proposed as a solution to reduce energy consumption during physical vapor deposition processing and enable coatings on temperature-sensitive substrates. In this approach, no substrate heating is used (substrate temperature is lower than 150 C-o) and the thermally activated adatom mobility, necessary to grow dense films, is substituted by overlapping collision cascades induced by heavy ion bombardment and consisting predominantly of low-energy recoils. Here, we present direct evidence for the crucial role of W+ ion irradiation in the densification of Ti0.31Al0.60W0.09N films grown by the hybrid W-HiPIMS/TiAl-DCMS co-sputtering. The peak target current density J(max) on the W target is varied from 0.06 to 0.78 A/cm(2) resulting in more than fivefold increase in the number of W+ ions per deposited metal atom, eta = W+/(W + Al + Ti) determined by time-resolved ion mass spectrometry analyses performed at the substrate plane under conditions identical to those during film growth. The DCMS is adjusted appropriately to maintain the W content in the films constant at Ti0.31Al0.60W0.09N. The degree of porosity, assessed qualitatively from cross-sectional SEM images and quantitatively from oxygen concentration profiles as well as nanoindentation hardness, is a strong function of eta ( J m a x ). Layers grown with low eta values are porous and soft, while those deposited under conditions of high eta are dense and hard. Nanoindentation hardness of Ti0.31Al0.60W0.09N films with the highest density is & SIM;33 GPa, which is very similar to values reported for layers deposited at much higher temperatures (420-500 C-o) by conventional metal-ion-based techniques. These results prove that the hybrid HiPIMS/DCMS co-sputtering with bias pulses synchronized to high mass metal ion irradiation can be successfully used to replace conventional solutions. The large energy losses ...