693.932 PEOPLE
| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Greczynski, Grzegorz
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (83/83 displayed)
- 2025Epitaxial growth of TiZrNbTaN films without external heating by high-power impulse magnetron sputteringcitations
- 2024Reflective, polarizing, and magnetically soft amorphous neutron optics with $^{11}$B-enriched B$_4$Ccitations
- 2024Advanced film/substrate interface engineering for adhesion improvement employing time- and energy-controlled metal ion irradiationcitations
- 2024Reflective, polarizing, and magnetically soft amorphous neutron optics with 11B-enriched B4Ccitations
- 2024High-power impulse magnetron sputter deposition of TiBx thin films : Effects of pulse length and peak current densitycitations
- 2024Electronic structure and thermoelectric properties of epitaxial Sc1−xVxNy thin films grown on MgO(001)citations
- 2023Dense and hard TiWC protective coatings grown with tungsten ion irradiation using WC-HiPIMS/TiC-DCMS co-sputtering technique without external heatingcitations
- 2023Towards lowering energy consumption during magnetron sputtering: Benefits of high-mass metal ion irradiationcitations
- 2023Energy-efficient physical vapor deposition of dense and hard Ti-Al-W-N coatings deposited under industrial conditionscitations
- 2023Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B$_4$C incorporationcitations
- 2023Determining role of W+ ions in the densification of TiAlWN thin films grown by hybrid HiPIMS/DCMS technique with no external heatingcitations
- 2023Thermoelectric properties and electronic structure of Cr(Mo,V)Nx thin films studied by synchrotron and lab-based x-ray spectroscopycitations
- 2023Morphology control in Ni/Ti multilayer neutron mirrors by ion-assisted interface engineering and B4C incorporationcitations
- 2023Discovery of Guinier-Preston zone hardening in refractory nitride ceramicscitations
- 2023Critical method evaluation refutes the Ar 2p signal of implanted Ar for referencing X-ray photoelectron spectracitations
- 2022High-entropy transition metal nitride thin films alloyed with Al : Microstructure, phase composition and mechanical propertiescitations
- 2022Dense, single-phase, hard, and stress-free Ti0.32Al0.63W0.05N films grown by magnetron sputtering with dramatically reduced energy consumptioncitations
- 2022Domain epitaxial growth of Ta3N5 film on c-plane sapphire substratecitations
- 2022Nano-columnar, self-organised NiCrC/a-C:H thin films deposited by magnetron sputteringcitations
- 2022Microstructure, mechanical, and corrosion properties of Zr1-xCrxBy diboride alloy thin films grown by hybrid high power impulse/DC magnetron co-sputteringcitations
- 2022The effect of the Nb concentration on the corrosion resistance of nitrogen-containing multicomponent TiZrTaNb-based films in acidic environmentscitations
- 2022Thermal, electrical, and mechanical properties of hard nitrogen-alloyed Cr thin films deposited by magnetron sputteringcitations
- 2021Orthorhombic Ta3-xN5-yOy thin films grown by unbalanced magnetron sputtering : The role of oxygen on structure, composition, and optical propertiescitations
- 2021Dense Ti0.67Hf0.33B1.7 thin films grown by hybrid HfB2-HiPIMS/TiB2-DCMS co-sputtering without external heatingcitations
- 2021Toward energy-efficient physical vapor deposition : Routes for replacing substrate heating during magnetron sputter deposition by employing metal ion irradiationcitations
- 2021Age hardening in superhard ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2021Towards energy-efficient physical vapor deposition : Mapping out the effects of W+ energy and concentration on the densification of TiAlWN thin films grown with no external heatingcitations
- 2021Preparation and tunable optical properties of amorphous AlSiO thin filmscitations
- 2021Phase formation and structural evolution of multicomponent (CrFeCo)Ny filmscitations
- 2021Phase Transformation and Superstructure Formation in (Ti0.5, Mg0.5)N Thin Films through High-Temperature Annealingcitations
- 2021Systematic compositional analysis of sputter-deposited boron-containing thin filmscitations
- 2020Oxidation behaviour of V2AlC MAX phase coatingscitations
- 2020Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)N-x coatingscitations
- 2020Microstructure and mechanical, electrical, and electrochemical properties of sputter-deposited multicomponent (TiNbZrTa)N-x coatingscitations
- 2020Growth of dense, hard yet low-stress Ti0.40Al0.27W0.33N nanocomposite films with rotating substrate and no external substrate heatingcitations
- 2020Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)N-x filmscitations
- 2020Improving the high-temperature oxidation resistance of TiB2 thin films by alloying with Alcitations
- 2020Effect of nitrogen content on microstructure and corrosion resistance of sputter-deposited multicomponent (TiNbZrTa)Nx filmscitations
- 2019Strategy for simultaneously increasing both hardness and toughness in ZrB2-rich Zr1-xTaxBy thin filmscitations
- 2019Reactive magnetron sputtering of tungsten target in krypton/trimethylboron atmospherecitations
- 2019Corrosion Resistant TiTaN and TiTaAlN Thin Films Grown by Hybrid HiPIMS/DCMS Using Synchronized Pulsed Substrate Bias with No External Substrate Heatingcitations
- 2019A simple model for non-saturated reactive sputtering processescitations
- 2019Synthesis and characterization of single-phase epitaxial Cr2N thin films by reactive magnetron sputteringcitations
- 2019Control over the Phase Formation in Metastable Transition Metal Nitride Thin Films by Tuning the Al+ Subplantation Depthcitations
- 2019Effect of impurities on morphology, growth mode, and thermoelectric properties of (111) and (001) epitaxial-like ScN filmscitations
- 2018Time evolution of ion fluxes incident at the substrate plane during reactive high-power impulse magnetron sputtering of groups IVb and VIb transition metals in Ar/N-2citations
- 2018Reference binding energies of transition metal carbides by core-level x-ray photoelectron spectroscopy free from Ar+ etching artefactscitations
- 2018Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputteringcitations
- 2018Effect of ion-implantation-induced defects and Mg dopants on the thermoelectric properties of ScNcitations
- 2017Control of the metal/gas ion ratio incident at the substrate plane during high-power impulse magnetron sputtering of transition metals in Arcitations
- 2017Core-level spectra and binding energies of transition metal nitrides by non-destructive x-ray photoelectron spectroscopy through capping layerscitations
- 2017Unprecedented Al supersaturation in single-phase rock salt structure VAlN films by Al+ subplantationcitations
- 2017Low-temperature growth of dense and hard Ti0.41Al0.51Ta0.08N films via hybrid HIPIMS/DC magnetron co-sputtering with synchronized metal-ion irradiationcitations
- 2017Selectable phase formation in VAlN thin films by controlling Al+ subplantation depthcitations
- 2017Comparative study of macro- and microtribological properties of carbon nitride thin films deposited by HiPIMScitations
- 2017Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrorscitations
- 2017Impact of B4C co-sputtering on structure and optical performance of Cr/Sc multilayer X-ray mirrorscitations
- 2017Gas rarefaction effects during high power pulsed magnetron sputtering of groups IVb and VIb transition metals in Arcitations
- 2017Native target chemistry during reactive dc magnetron sputtering studied by ex-situ x-ray photoelectron spectroscopycitations
- 2016Improved adhesion of carbon nitride coatings on steel substrates using metal HiPIMS pretreatmentscitations
- 2016Nitrogen-doped bcc-Cr films: Combining ceramic hardness with metallic toughness and conductivitycitations
- 2016Novel transparent Mg-Si-O-N thin films with high hardness and refractive indexcitations
- 2016Theoretical and experimental study of metastable solid solutions and phase stability within the immiscible Ag-Mo binary systemcitations
- 2016Peak amplitude of target current determines deposition rate loss during high power pulsed magnetron sputteringcitations
- 2016A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNX thin film growth with different inert gasescitations
- 2016Rolling contact fatigue of bearing components coated with carbon nitride thin filmscitations
- 2016Venting temperature determines surface chemistry of magnetron sputtered TiN filmscitations
- 2015Synthesis and characterization of Zr2Al3C4 thin filmscitations
- 2015Strategy for tuning the average charge state of metal ions incident at the growing film during HIPIMS depositioncitations
- 2015Control of Ti1-xSixN nanostructure via tunable metal-ion momentum transfer during HIPIMS/DCMS co-depositioncitations
- 2015Low-temperature growth of low friction wear-resistant amorphous carbon nitride thin films by mid-frequency, high power impulse, and direct current magnetron sputteringcitations
- 2014Novel strategy for low-temperature, high-rate growth of dense, hard, and stress-free refractory ceramic thin filmscitations
- 2014X-ray photoelectron spectroscopy analyses of the electronic structure of polycrystalline Ti1-xAlxN thin films with 0 < x < 0.96citations
- 2014Growth and properties of amorphous Ti-B-Si-N thin films deposited by hybrid HIPIMS/DC-magnetron co-sputtering from TiB2 and Si targetscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Influence of inert gases on the reactive high power pulsed magnetron sputtering process of carbon-nitride thin filmscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.64citations
- 2012Metal versus rare-gas ion irradiation during Ti1-xAlxN film growth by hybrid high power pulsed magnetron/dc magnetron co-sputtering using synchronized pulsed substrate biascitations
- 2011Ti-Si-C-N Thin Films Grown by Reactive Arc Evaporation from Ti3SiC2 Cathodescitations
- 2011CF(x) thin solid films deposited by high power impulse magnetron sputtering: Synthesis and characterizationcitations
- 2010Time and energy resolved ion mass spectroscopy studies of the ion flux during high power pulsed magnetron sputtering of Cr in Ar and Ar/N-2 atmospherescitations
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article
Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02
Abstract
<jats:p>VxMo(1-x)Ny thin films grown by ultrahigh vacuum reactive magnetron sputter deposition on MgO(001) substrates are analyzed by x-ray photoelectron spectroscopy (XPS). This contribution presents analytical results for 300-nm-thick 002-textured polycrystalline V0.49Mo0.51N1.02 films deposited by reactive cosputtering from V (99.95 % purity) and Mo (99.95 % purity) targets. Film growth is carried out at 500 °C in mixed Ar/N2 atmospheres at a total pressure of 5 mTorr, with a N2 partial pressure of 3.2 mTorr; a bias of −30 V is applied to the substrate. Films composition is determined by Rutherford backscattering spectrometry (RBS). XPS measurements employ monochromatic Al Kα radiation (hν = 1486.6 eV) to analyze V0.49Mo0.51N1.02 surface sputter-cleaned in-situ with 4 keV Ar+ ions incident at an angle of 70° with respect to the surface normal. XPS results show that the ion-etched sample surfaces have no measurable oxygen or carbon contamination; film composition, obtained using XPS sensitivity factors, is V0.34Mo0.66N1.00. All core level peaks, including the nearby Mo 3p3/2 (binding energy of 394.3 eV) and N 1s (at 397.4 eV) peaks, are well-resolved. Comparison to V0.33Mo0.67N0.64 and V0.34Mo0.66N0.81 single-crystal film surfaces, submitted separately to Surface Science Spectra, indicates that with decreasing growth temperature from 900 to 700 and 500 °C (and increasing nitrogen concentration in VxMo(1-x)Ny from y = 0.64 to 0.81 and 1.00) the N 1s core level peak shifts from 397.6 eV to 397.5 eV to 397.4 eV while metal atom peaks move towards higher binding energy by 0.2-0.4 eV.</jats:p>