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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Kindlund, Hanna
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Topics
Publications (10/10 displayed)
- 2018Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin filmscitations
- 2018Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin filmscitations
- 2014Effect of WN content on toughness enhancement in V1−xWxN/MgO(001) thin filmscitations
- 2014Toughness Enhancement in Hard Single-Crystal Transition-Metal Nitrides : V-Mo-N and V-W-N Alloyscitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.92citations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.02citations
- 2013Epitaxial V0.6W0.4N/MgO(001): Evidence for ordering on the cation sublatticecitations
- 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.64citations
- 2013Toughness enhancement in hard ceramic thin films by alloy designcitations
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article
Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin films
Abstract
<jats:p>Pseudobinary V0.5Mo0.5Nx(111) alloys with the B1-NaCl crystal structure are grown on Al2O3(0001) substrates in an ultra-high-vacuum system by reactive magnetron sputter deposition in mixed Ar/N2 atmospheres at temperatures Ts between 100 and 900 °C. Nitrogen-to-metal, N/(V + Mo), fractions x vary monotonically from 0.9 ± 0.1 with Ts = 100 °C to 0.4 ± 0.1 at Ts = 900 °C. Nitrogen loss at higher growth temperatures leads to a corresponding decrease in the relaxed lattice parameter ao from 4.21 ± 0.01 Å at Ts = 300 °C to 4.125 ± 0.005 Å with Ts = 900 °C. Scanning electron micrographs of cube-corner nanoindents extending into the substrate show that the films are relatively ductile, exhibiting material pile-up (plastic flow) around the indent edges. Nanoindentation hardnesses H and elastic moduli E, obtained using a calibrated Berkovich tip, of V0.5Mo0.5Nx(111) layers increase with increasing Ts (decreasing x) from 15 ± 1 and 198 ± 5 GPa at 100 °C to 23 ± 2 and 381 ± 11 GPa at 900 °C. These values are lower than the corresponding results obtained for the 001-oriented V0.5Mo0.5Nx films. In addition, film wear resistance increases with increasing Ts, while the coefficient of friction, under 1000 μN loads, is 0.09 ± 0.01 for all layers.</jats:p>