Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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Kindlund, Hanna

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (10/10 displayed)

  • 2018Growth and mechanical properties of 111-oriented V0.5Mo0.5Nx/Al2O3(0001) thin films17citations
  • 2018Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films20citations
  • 2014Effect of WN content on toughness enhancement in V1−xWxN/MgO(001) thin films51citations
  • 2014Toughness Enhancement in Hard Single-Crystal Transition-Metal Nitrides : V-Mo-N and V-W-N Alloys2citations
  • 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 3. Polycrystalline V0.49Mo0.51N1.027citations
  • 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 2. Single-crystal V0.47Mo0.53N0.9211citations
  • 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001)Thin Films Analyzed by X-ray PhotoelectronSpectroscopy: 3. Polycrystalline V0.49Mo0.51N1.027citations
  • 2013Epitaxial V0.6W0.4N/MgO(001): Evidence for ordering on the cation sublattice18citations
  • 2013Sputter-cleaned Epitaxial VxMo(1-x)Ny/MgO(001) Thin Films Analyzed by X-ray Photoelectron Spectroscopy: 1. Single-crystal V0.48Mo0.52N0.6412citations
  • 2013Toughness enhancement in hard ceramic thin films by alloy design127citations

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Hultman, Lars
5 / 179 shared
Birch, Jens
1 / 73 shared
Broitman, Esteban
1 / 31 shared
Lu, Jun
1 / 78 shared
Petrov, Ivan
5 / 55 shared
Greene, J. E.
4 / 15 shared
Fankhauser, Joshua
1 / 2 shared
Aleman, Angel
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Prikhodko, Sergey V.
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Goorsky, Mark S.
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Zaid, Hicham
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Kodambaka, Suneel
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Li, Chao
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Sangiovanni, D. G.
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Hultman, L.
3 / 17 shared
Lu, J.
3 / 19 shared
Chirita, V.
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Petrov, I.
3 / 13 shared
Jensen, J.
3 / 6 shared
Greene, Joe
1 / 1 shared
Greczynski, Grzegorz
4 / 83 shared
Greene, Joseph E.
2 / 30 shared
Greene, Joseph
1 / 1 shared
Birch, J.
1 / 6 shared
Martínez-De-Olcoz, L.
1 / 1 shared
Chart of publication period
2018
2014
2013

Co-Authors (by relevance)

  • Hultman, Lars
  • Birch, Jens
  • Broitman, Esteban
  • Lu, Jun
  • Petrov, Ivan
  • Greene, J. E.
  • Fankhauser, Joshua
  • Aleman, Angel
  • Prikhodko, Sergey V.
  • Goorsky, Mark S.
  • Zaid, Hicham
  • Kodambaka, Suneel
  • Li, Chao
  • Sangiovanni, D. G.
  • Hultman, L.
  • Lu, J.
  • Chirita, V.
  • Petrov, I.
  • Jensen, J.
  • Greene, Joe
  • Greczynski, Grzegorz
  • Greene, Joseph E.
  • Greene, Joseph
  • Birch, J.
  • Martínez-De-Olcoz, L.
OrganizationsLocationPeople

article

Ultrahigh vacuum dc magnetron sputter-deposition of epitaxial Pd(111)/Al2O3(0001) thin films

  • Fankhauser, Joshua
  • Aleman, Angel
  • Kindlund, Hanna
  • Prikhodko, Sergey V.
  • Goorsky, Mark S.
  • Zaid, Hicham
  • Kodambaka, Suneel
  • Li, Chao
Abstract

Pd(111) thin films, ∼245 nm thick, are deposited on Al2O3(0001) substrates at ≈0.5Tm, where Tm is the Pd melting point, by ultrahigh vacuum dc magnetron sputtering of Pd target in pure Ar discharges. Auger electron spectra and low-energy electron diffraction patterns acquired in situ from the as-deposited samples reveal that the surfaces are compositionally pure 111-oriented Pd. Double-axis x-ray diffraction (XRD) ω-2θ scans show only the set of Pd 111 peaks from the film. In triple-axis high-resolution XRD, the full width at half maximum intensity Γω of the Pd 111 ω-rocking curve is 630 arc sec. XRD 111 pole figure obtained from the sample revealed six peaks 60°-apart at a tilt angles corresponding to Pd 111 reflections. XRD φ scans show six 60°-rotated 111 peaks of Pd at the same φ angles for 11 23 of Al2O3 based on which the epitaxial crystallographic relationships between the film and the substrate are determined as (111)Pd∥ (0001)Al2O3 with two in-plane orientations of [112]Pd∥ [1120]Al2O3 and [211]Pd∥ [1120]Al2O3. Using triple axis symmetric and asymmetric reciprocal space maps, interplanar spacings of out-of-plane (111) and in-plane (11 2) are found to be 0.2242 ± 0.0003 and 0.1591 ± 0.0003 nm, respectively. These values are 0.18% lower than 0.2246 nm for (111) and the same, within the measurement uncertainties, as 0.1588 nm for (11 2) calculated from the bulk Pd lattice parameter, suggesting a small out-of-plane compressive strain and an in-plane tensile strain related to the thermal strain upon cooling the sample from the deposition temperature to room temperature. High-resolution cross-sectional transmission electron microscopy coupled with energy dispersive x-ray spectra obtained from the Pd(111)/Al2O3(0001) samples indicate that the Pd-Al2O3 interfaces are essentially atomically abrupt and dislocation-free. These results demonstrate the growth of epitaxial Pd thin films with (111) out-of-plane orientation with low mosaicity on Al2O3(0001).

Topics
  • Deposition
  • impedance spectroscopy
  • surface
  • x-ray diffraction
  • thin film
  • electron diffraction
  • transmission electron microscopy
  • dislocation
  • size-exclusion chromatography