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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Howling, Alan
École Polytechnique Fédérale de Lausanne
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (3/3 displayed)
- 2021Advantages and Limitations of Surface Analysis Techniques on Plasma-Treated Arabidopsis thaliana Seedscitations
- 2007Optimization of the microcrystalline silicon deposition efficiencycitations
- 2005Measurements and consequences of nonuniform radio frequency plasma potential due to surface asymmetry in large area radio frequency capacitive reactorscitations
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article
Optimization of the microcrystalline silicon deposition efficiency
Abstract
<jats:p>Cost reduction constraints for microcrystalline silicon thin film photovoltaic solar cells require high deposition rates and high silane gas utilization efficiencies. If the requirements in deposition rate have sometimes been fulfilled, it is generally not the case for the silane utilization. In this work, a reactor-independent methodology has been developed to determine the optimum plasma parameters in terms of deposition rate, silane utilization, and material microstructure. Using this optimization method, a microcrystalline layer has been deposited over a large area at a rate of 10.9Å∕s, with a silane utilization efficiency above 80%.</jats:p>