| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Alias, Afishah
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2020Structural and Optical Properties of ZnO and MgZnO Semiconductor Materials at Different Annealing Temperature
- 2018Electrical simulation of different photoactive layer thickness on organic heterojunction solar cellcitations
- 2017Frequency and voltage dependent electrical responses of poly(triarylamine) thin film-based organic Schottky diodecitations
- 2017The Structural and Optical Properties of Poly(Triarylamine) (PTAA) Thin Films Prepared at Different Spin Rate Using Spin Coating Methodcitations
- 2016Annealing heat treatment of Poly(triarylamine) (PTAA) thin films deposited using spin coating
- 2015GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING
- 2015Structural properties 3,16-bis triisopropylsilylethynyl (pentacene) (TIPS-pentacene) thin films onto organic dielectric layer using slide coating method
- 2015PREPARATION AND CHARACTERIZATION OF CARBON NANOFIBERS / METAKAOLIN GEOPOLYMER BASED NANOCOMPOSITE
- 2015Fabrication and characterization of 6,13-bis(triisopropylsilylethynyl)-pentacene active semiconductor thin films prepared by flow-coating methodcitations
- 2015EFFECT OF SPUTTERING PRESSURE ON THE STRUCTURAL AND OPTICAL PROPERTIES OF ZNO FILMS DEPOSITED ON FLEXIBLE SUBSTRATEcitations
- 2013Effect of [6,6]-Phenyl-C 61 butyric acid methyl ester (PCBM) agglomerated nanostructure on device performance in organic thin-film transistorscitations
- 2011Fabrication of ZnO Thin-Film Transistors by Chemical Vapor Deposition Method using Zinc Acetate Solutioncitations
Places of action
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article
EFFECT OF SPUTTERING PRESSURE ON THE STRUCTURAL AND OPTICAL PROPERTIES OF ZNO FILMS DEPOSITED ON FLEXIBLE SUBSTRATE
Abstract
Zinc Oxide (ZnO) has get attention because of its excellent optical transmittance approximately ~80%. A systematic study has been made of the effect of sputtering pressure on the structural and optical properties of the deposited ZnO films. ZnO thin films were deposited on plastic substrate by RF powered magnetron sputtering using ZnO disk with 99.99% purity. The RF power of 100 W and argon gas flow from 10 - 30 sccm was used to perform the sputtering process. The argon sputtering pressure was varied between 3 mTorr to 11 mTorr and the growth time is constant at 25 minute. The deposited ZnO thin films are characterized structurally and optically. Structural analysis using X-Ray Diffraction (XRD) show that all the films exhibit a (002) preferential orientation and the estimated grain size measured was varied from 24.5 nm to 29.8 nm. Surface Profilometer was used to measure the thickness and RMS of the deposited films where the thickness decrease from 900 nm to 600 nm and the root mean square (RMS) roughness increase from 4.97 nm to 11.45 nm. The optical transparency value that achieved from UV-Vis Spectrometer is over 80% in the visible range and the band gap energy is within 3.27 eV-3.29 eV range.