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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Alias, Afishah
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2020Structural and Optical Properties of ZnO and MgZnO Semiconductor Materials at Different Annealing Temperature
- 2018Electrical simulation of different photoactive layer thickness on organic heterojunction solar cellcitations
- 2017Frequency and voltage dependent electrical responses of poly(triarylamine) thin film-based organic Schottky diodecitations
- 2017The Structural and Optical Properties of Poly(Triarylamine) (PTAA) Thin Films Prepared at Different Spin Rate Using Spin Coating Methodcitations
- 2016Annealing heat treatment of Poly(triarylamine) (PTAA) thin films deposited using spin coating
- 2015GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING
- 2015Structural properties 3,16-bis triisopropylsilylethynyl (pentacene) (TIPS-pentacene) thin films onto organic dielectric layer using slide coating method
- 2015PREPARATION AND CHARACTERIZATION OF CARBON NANOFIBERS / METAKAOLIN GEOPOLYMER BASED NANOCOMPOSITE
- 2015Fabrication and characterization of 6,13-bis(triisopropylsilylethynyl)-pentacene active semiconductor thin films prepared by flow-coating methodcitations
- 2015EFFECT OF SPUTTERING PRESSURE ON THE STRUCTURAL AND OPTICAL PROPERTIES OF ZNO FILMS DEPOSITED ON FLEXIBLE SUBSTRATEcitations
- 2013Effect of [6,6]-Phenyl-C 61 butyric acid methyl ester (PCBM) agglomerated nanostructure on device performance in organic thin-film transistorscitations
- 2011Fabrication of ZnO Thin-Film Transistors by Chemical Vapor Deposition Method using Zinc Acetate Solutioncitations
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article
GROWTH CHARACTERISTIC OF GZO FILM FABRICATED BY RF MAGNETRON SPUTTERING
Abstract
This paper investigate the dependence of film thickness onto characteristic of Gallium doped Zinc Oxide (GZO). GZO films were deposited on a glass substrate by RF Magnetron Sputtering using GZO ceramic target with 99.99% purity. Thicknesses were altered by varying the deposition time from 10 min to 50 min meanwhile the sputtering power, argon flow and target distance were fixed in order to investigate the influence of film thickness to the growth characteristic, structural, optical properties and surface morphology of the films. Sputtering was performed with RF power of 100 watt and the argon flow was set at 10 sccm. GZO thin films on various thicknesses range from 130 nm to 460 nm were successfully deposited onto glass substrate with the crystallite grain size in range of 20.63 nm to 22.04 nm with the optical transmittance above 85 %.