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Naji, M. |
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Motta, Antonella |
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Aletan, Dirar |
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Mohamed, Tarek |
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Ertürk, Emre |
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Taccardi, Nicola |
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Petrov, R. H. | Madrid |
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Alshaaer, Mazen | Brussels |
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Bih, L. |
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Casati, R. |
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Kočí, Jan | Prague |
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Kalteremidou, Kalliopi-Artemi | Brussels |
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Azam, Siraj |
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Ospanova, Alyiya |
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Ali, M. A. |
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Popa, V. |
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Rančić, M. |
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Ollier, Nadège |
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Azevedo, Nuno Monteiro |
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Landes, Michael |
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Bhoi, Biswanath
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article
Effect of Annealing on the Structural and FMR Properties of Epitaxial YIG Thin Films Grown by RF Magnetron Sputtering
Abstract
<p>The growth- and frequency-dependent microwave studies on ~ 250 nm thick Y&#x2083;Fe&#x2085;O&#x2081;&#x2082; [yttrium iron garnet (YIG)] films deposited on Gd&#x2083;Ga&#x2085;O&#x2081;&#x2082; (111) (gadolinium gallium garnet) substrates by RF magnetron sputtering has been reported. After the deposition, the thin films were ex-situ annealed in air at 700 &#x00B0;C for different time intervals (2, 4, 6, and 10 h) and a pure YIG phase with preferred (111) orientation was formed. Effective saturation magnetization (4&#x03C0; Meff) has been estimated from ferromagnetic resonance (FMR) data using Kittel's equations. A negative uniaxial magnetic anisotropy has been observed which decreased with the increase in annealing time. The FMR linewidth (&#x0394; H) for the 10 h annealed film was found to be nearly half of the one annealed for 2 h. The 10 h annealed film showed a &#x0394; H value which lies between 30 and 50 Oe over a wide frequency range (2-18 GHz). This improvement in the microwave properties as a result of annealing is attributed to the reduction of defects and relaxation of stress.</p>