| People | Locations | Statistics |
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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Sahdan, Mohd Zainizan
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (12/12 displayed)
- 2018Mechanism of room temperature oxygen sensor based on nanocrystalline TiO2 filmcitations
- 2018Difference in structural and chemical properties of sol–gel spin coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopantscitations
- 2016Sputter Deposition of Cuprous and Cupric Oxide Thin Films Monitored by Optical Emission Spectroscopy for Gas Sensing Applicationscitations
- 2016Correlation between Microstructure of Copper Oxide Thin Films and its Gas Sensing Performance at Room Temperaturecitations
- 2015Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabricationcitations
- 2015Fabrication of inverted bulk heterojunction organic solar cells based on conjugated P3HT:PCBM using various thicknesses of ZnO buffer layercitations
- 2015Influence of TiO2 thin film annealing temperature on electrical properties synthesized by CVD technique
- 2014Glass etching for cost-effective microchannels fabricationcitations
- 2014Physical and optical studies on ZnO films by SOL-GELcitations
- 2013Oxide semiconductors for solar to chemical energy conversion: nanotechnology approachcitations
- 2013Morphology, topography and thickness of copper oxide thin films deposited using magnetron sputtering techniquecitations
- 2012Sol-gel Synthesis of TiO 2 Thin Films from In-house Nano-TiO 2 Powder
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document
Glass etching for cost-effective microchannels fabrication
Abstract
The available fabrication of microfluidic in industry involves with complex and expensive procedures. It is crucial to find another alternative which can reduce the cost production, simplify the process, and promote to a rapid production cycle. In this paper, a cost-effective approach of glass etching procedure for microchannels fabrication is described. The procedure involves with masking preparation using positive photoresist PR1-4000A, photolithography technique, and effective wet chemical etching process. From the experimental, good photoresist mask thickness and adherence was achieved. Then, acceptable etching rate, photoresist resistant, and surface roughness were obtained with suitable hydrofluoric acid (HF), hydrochloric acid (HC1), and de-ionized (DI) water composition. The presented simple fabrication process is suitable for fast prototyping and manufacturing disposable microfluidic devices. With the optimized process, a glass-based microchannels with etching depth up to 70um was produced.