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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Tiggelaar, Roald M.
University of Twente
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (4/4 displayed)
- 2022Fabrication of microstructures in the bulk and on the surface of sapphire by anisotropic selective wet etching of laser-affected volumescitations
- 2020Massive Parallel NEMS Flow Restriction Fabricated Using Self-Aligned 3D-Crystallographic Nanolithographycitations
- 2018Three-dimensional fractal geometry for gas permeation in microchannelscitations
- 2003A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactorscitations
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document
A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactors
Abstract
By using microreactors fabricated with silicon microtechnology, heterogeneous catalyzed gas-phase reactions can be studied which are difficult to control because of their exothermic nature, are explosive or use toxic/hazardous gases. In this type of microreactors, catalytic materials like rhodium or platinum are deposited on a thin membrane in deep trenches. Conventional techniques, like lift-off lithography, cannot be used in deep trenches and deposition through flat shadow masks does not yield well-defined regions of catalyst. For well-controlled deposition of a catalytic thin film on a membrane located in a deep trench, a technique is developed using sputter deposition with a 3-dimensionally shaped 'self-aligning' shadow mask.