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| Naji, M. |
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| Motta, Antonella |
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| Aletan, Dirar |
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| Mohamed, Tarek |
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| Ertürk, Emre |
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| Taccardi, Nicola |
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| Kononenko, Denys |
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| Petrov, R. H. | Madrid |
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| Alshaaer, Mazen | Brussels |
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| Bih, L. |
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| Casati, R. |
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| Muller, Hermance |
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| Kočí, Jan | Prague |
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| Šuljagić, Marija |
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| Kalteremidou, Kalliopi-Artemi | Brussels |
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| Azam, Siraj |
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| Ospanova, Alyiya |
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| Blanpain, Bart |
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| Ali, M. A. |
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| Popa, V. |
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| Rančić, M. |
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| Ollier, Nadège |
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| Azevedo, Nuno Monteiro |
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| Landes, Michael |
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| Rignanese, Gian-Marco |
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Sahdan, Mohd Zainizan
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Topics
Publications (12/12 displayed)
- 2018Mechanism of room temperature oxygen sensor based on nanocrystalline TiO2 filmcitations
- 2018Difference in structural and chemical properties of sol–gel spin coated Al doped TiO2, Y doped TiO2 and Gd doped TiO2 based on trivalent dopantscitations
- 2016Sputter Deposition of Cuprous and Cupric Oxide Thin Films Monitored by Optical Emission Spectroscopy for Gas Sensing Applicationscitations
- 2016Correlation between Microstructure of Copper Oxide Thin Films and its Gas Sensing Performance at Room Temperaturecitations
- 2015Spectroscopic Studies of Magnetron Sputtering Plasma Discharge in Cu/O2/Ar Mixture for Copper Oxide Thin Film Fabricationcitations
- 2015Fabrication of inverted bulk heterojunction organic solar cells based on conjugated P3HT:PCBM using various thicknesses of ZnO buffer layercitations
- 2015Influence of TiO2 thin film annealing temperature on electrical properties synthesized by CVD technique
- 2014Glass etching for cost-effective microchannels fabricationcitations
- 2014Physical and optical studies on ZnO films by SOL-GELcitations
- 2013Oxide semiconductors for solar to chemical energy conversion: nanotechnology approachcitations
- 2013Morphology, topography and thickness of copper oxide thin films deposited using magnetron sputtering techniquecitations
- 2012Sol-gel Synthesis of TiO 2 Thin Films from In-house Nano-TiO 2 Powder
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document
Morphology, topography and thickness of copper oxide thin films deposited using magnetron sputtering technique
Abstract
Cupric Oxide (CuO) is one of the p-type metal oxide semiconductors that are suitable for use in gas sensing device. The copper oxide thin film was prepared on silicon wafer by sputtering of pure copper target at difference deposition time of 5 min, 10 min and 15 min using RF magnetron sputtering technique. Argon flow rate, oxygen flow rate, RF power and working pressure were fixed at 50 sccm, 8 sccm, 400 W and 22.5 mTorr, respectively. The influence of the deposition time towards the surface morphology, topography and thickness has been investigated. SEM and AFM analysis showed that the grain size of the films increases with the increase of deposition time. However, the surface structure of the films remains the same. In addition, it is noticed that when the deposition time increased, the surface of the films becomes rougher. The deposition rate was approximately 29 nm/min, and it was evaluated from the film thickness deposited at several times.