Materials Map

Discover the materials research landscape. Find experts, partners, networks.

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The Materials Map is an open tool for improving networking and interdisciplinary exchange within materials research. It enables cross-database search for cooperation and network partners and discovering of the research landscape.

The dashboard provides detailed information about the selected scientist, e.g. publications. The dashboard can be filtered and shows the relationship to co-authors in different diagrams. In addition, a link is provided to find contact information.

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The Materials Map is still under development. In its current state, it is only based on one single data source and, thus, incomplete and contains duplicates. We are working on incorporating new open data sources like ORCID to improve the quality and the timeliness of our data. We will update Materials Map as soon as possible and kindly ask for your patience.

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in Cooperation with on an Cooperation-Score of 37%

Topics

Publications (10/10 displayed)

  • 2023Magnetron Sputter Grown AlN Nanostructures with Giant Piezoelectric Response toward Energy Generation5citations
  • 2023Magnetron Sputter Deposition of Nanostructured AlN Thin Films7citations
  • 2019Structure and properties of Ta/Al/Ta and Ti/Al/Ti/Au multilayer metal stacks formed as ohmic contacts on n-GaN8citations
  • 2018Ultra-thin titanium nitride films for refractory spectral selectivity [Invited]30citations
  • 2018Ultra-thin titanium nitride films for refractory spectral selectivity30citations
  • 2018Optical characterization of SiC films grown on Si(111)citations
  • 2018Optical characterization of SiC films grown on Si(111)citations
  • 2017Growth of aluminum oxide on silicon carbide with an atomically sharp interface3citations
  • 2016Atomically controlled, self-limiting procedures for growth of aluminum oxide on SiC-on-Sicitations
  • 2015Electric field mapping inside metallized film capacitors1citations

Places of action

Chart of shared publication
Popok, Vladimir N.
4 / 59 shared
Chirumamilla, Manohar
4 / 14 shared
Ritter, Martin
2 / 15 shared
Krekeler, Tobias
2 / 19 shared
Wang, Deyong
3 / 7 shared
Kristensen, Peter Kjær
3 / 14 shared
Julsgaard, Brian
3 / 9 shared
Walter, Thomas
1 / 5 shared
Stöger-Pollach, Michael
1 / 6 shared
Boturchuk, Ievgen
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Khatibi, Golta
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Schwarz, Sabine
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Bozhevolnyi, Sergey I.
2 / 35 shared
An, Liqiong
2 / 2 shared
Roberts, Alexander S.
1 / 2 shared
Mortensen, N. Asger
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Roberts, Alexander
1 / 6 shared
Juri, Raghavendra Rao
1 / 1 shared
Hansen, John Lundsgaard
2 / 7 shared
Juluri, Raghavendra Rao
1 / 4 shared
Morgen, Per
1 / 20 shared
Silva, Ana Gomes
1 / 2 shared
Li, Zheshen
1 / 24 shared
Hvam, Jeanette
1 / 9 shared
Dhiman, Rajnish
1 / 5 shared
Gomes-Silva, Ana
1 / 10 shared
Li, Zheshen S.
1 / 1 shared
Nielsen, Dennis Achton
1 / 2 shared
Chart of publication period
2023
2019
2018
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2015

Co-Authors (by relevance)

  • Popok, Vladimir N.
  • Chirumamilla, Manohar
  • Ritter, Martin
  • Krekeler, Tobias
  • Wang, Deyong
  • Kristensen, Peter Kjær
  • Julsgaard, Brian
  • Walter, Thomas
  • Stöger-Pollach, Michael
  • Boturchuk, Ievgen
  • Khatibi, Golta
  • Schwarz, Sabine
  • Bozhevolnyi, Sergey I.
  • An, Liqiong
  • Roberts, Alexander S.
  • Mortensen, N. Asger
  • Roberts, Alexander
  • Juri, Raghavendra Rao
  • Hansen, John Lundsgaard
  • Juluri, Raghavendra Rao
  • Morgen, Per
  • Silva, Ana Gomes
  • Li, Zheshen
  • Hvam, Jeanette
  • Dhiman, Rajnish
  • Gomes-Silva, Ana
  • Li, Zheshen S.
  • Nielsen, Dennis Achton
OrganizationsLocationPeople

document

Electric field mapping inside metallized film capacitors

  • Popok, Vladimir N.
  • Pedersen, Kjeld
  • Nielsen, Dennis Achton
Abstract

Failure mode and effect analysis (FMEA) is an important step in the reliability assessment process of electric components. It provides knowledge of the physics of failure of a component that has been subjected to a given stress profile. This knowledge enables improvement of the component robustness and durability and serves as verification that failure- and degradation mechanisms remain the same at different stress levels during accelerated testing.<br/>In this work we have used Kelvin probe force microscopy (KPFM) to analyze metallized film capacitors with the purpose of determining the degradation mechanism(s) they suffered from accelerated testing. We have prepared film capacitors for analysis by micro-sectioning and verified the quality of the preparation procedure using optical and atomic force microscopy. <br/>The potential distribution in the layer structure (alternating 7 µm thick dielectric and 50-100 nm thick metal) of a new capacitor was used as reference. KPFM measurements on the degraded capacitors showed a change in contact potential difference from -0.61V on the reference capacitor to 3.2V on the degraded ones, indicating that corrosion of the metallization had happened. Studies also showed that some of the metallization stripes had lost contact to the end-spray.<br/>Thus, it is shown that the surface electric potential distributions on micro-sectioned film capacitors can be obtained through KPFM analysis. We have, from KPFM measurements, shown that the degraded capacitors under investigation had suffered from metallization corrosion and some degree of end-spray detachment. The results obtained in this work, along with results from the literature, demonstrate the usefulness of KPFM as a tool for FMEA. <br/>

Topics
  • impedance spectroscopy
  • surface
  • corrosion
  • durability
  • Kelvin probe force microscopy
  • sectioning