693.932 PEOPLE
| People | Locations | Statistics |
|---|---|---|
| Naji, M. |
| |
| Motta, Antonella |
| |
| Aletan, Dirar |
| |
| Mohamed, Tarek |
| |
| Ertürk, Emre |
| |
| Taccardi, Nicola |
| |
| Kononenko, Denys |
| |
| Petrov, R. H. | Madrid |
|
| Alshaaer, Mazen | Brussels |
|
| Bih, L. |
| |
| Casati, R. |
| |
| Muller, Hermance |
| |
| Kočí, Jan | Prague |
|
| Šuljagić, Marija |
| |
| Kalteremidou, Kalliopi-Artemi | Brussels |
|
| Azam, Siraj |
| |
| Ospanova, Alyiya |
| |
| Blanpain, Bart |
| |
| Ali, M. A. |
| |
| Popa, V. |
| |
| Rančić, M. |
| |
| Ollier, Nadège |
| |
| Azevedo, Nuno Monteiro |
| |
| Landes, Michael |
| |
| Rignanese, Gian-Marco |
|
Oconnor, R.
in Cooperation with on an Cooperation-Score of 37%
Topics
Publications (7/7 displayed)
- 2022Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approachcitations
- 2020Aluminium oxide formation via atomic layer deposition using a polymer brush mediated selective infiltration approachcitations
- 2019Hard x-ray photoelectron spectroscopy study of copper formation by metal salt inclusion in a polymer filmcitations
- 2019Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy
- 2018Nucleation and adhesion of ultra-thin copper films on amino-terminated self-assembled monolayerscitations
- 2016In-situ surface and interface study of atomic oxygen modified carbon containing porous low-κ dielectric films for barrier layer applicationscitations
- 2011Modelling the evaporation of boron species. Part 1: Alkali-free borosilicate glass melts:
Places of action
| Organizations | Location | People |
|---|
document
Characterisation of Electroless Deposited Cobalt by Hard and Soft X-ray Photoemission Spectroscopy
Abstract
<p>Electroless deposited (ELD) cobalt with palladium as a catalyst, and an underlying self-assembled monolayer (SAM) was investigated for potential use in advanced complementary metal oxide semiconductor (CMOS) applications using both hard (HAXPES) and soft (XPS) x-ray photoelectron spectroscopy. HAXPES spectra established the uniformity of the deposited Co film and the nature of the buried Co-Si interface 20nm below the surface. The Pd is seen to diffuse through the Co following thermal annealing. While the deposited Co film is predominantly metallic, Co-silicide forms at the Co-Si interface upon deposition and decomposes with thermal anneal up to 500°C.</p>